Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO2 thin films with different substrate temperatures

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35674

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35674

Title:	Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO2 thin films with different substrate temperatures
Authors:	Cheng-Chung Lee,Hsi-Chao Chen,Cheng-Chung Jaing
Contributors:	薄膜技術研究中心
Keywords:	PHASE-SHIFTING INTERFEROMETRY;TITANIUM-OXIDE FILMS;EVAPORATION;DEPOSITION
Date:	2006
Issue Date:	2010-07-07 15:47:39 (UTC+8)
Publisher:	中央大學
Abstract:	Titanium oxide films were prepared by ion-beam-assisted deposition on glass substrates at various substrate temperatures. The effect of the temperature of thermal annealing from 100 degrees C to 300 degrees C on the optical properties and residual stress
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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