Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35678

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35678

Title:	Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat
Authors:	Ming-Chung Liu,Cheng-Chung Lee,Masaaki Kaneko,Kazuhide Nakahira,Yuuichi Takano
Contributors:	薄膜技術研究中心
Keywords:	VACUUM ULTRAVIOLET;OPTICAL COATINGS;FLUORIDE;LAF3
Date:	2006
Issue Date:	2010-07-07 15:47:45 (UTC+8)
Publisher:	中央大學
Abstract:	MgF2 and GdF3 materials, used for a single-layer coating at 193 mn, are deposited by a resistive-heating boat at specific substrate temperatures. Optical characteristics (transmittance, refractive index, extinction coefficient, and optical loss) and micro
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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