X-ray photoelectron spectroscopy study of thin TiO2 films cosputtered with Al

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35681

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35681

Title:	X-ray photoelectron spectroscopy study of thin TiO2 films cosputtered with Al
Authors:	Jin-Cherng Hsu,Paul W. Wang,Cheng-Chung Lee
Contributors:	薄膜技術研究中心
Keywords:	BEAM SPUTTER-DEPOSITION;OXIDE-FILMS;SILICON DIOXIDE;TITANIUM;EVAPORATION
Date:	2006
Issue Date:	2010-07-07 15:47:49 (UTC+8)
Publisher:	中央大學
Abstract:	In this study, titanium dioxide (TiO2) films were fabricated by cosputtering of a titanium (Ti) target and an aluminum (Al) slice in a smaller area by an ion-beam sputtering deposition method. The sputtered films were postannealed at 450 degrees C. The x-
Relation:	APPLIED OPTICS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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