Low alkaline contamination bilayer bottom antireflective coatings in F-2 excimer laser lithography

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35685

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35685

Title:	Low alkaline contamination bilayer bottom antireflective coatings in F-2 excimer laser lithography
Authors:	Chen,HL;Chuang,YF;Lee,CC;Ko,FH;Hsieh,CI;Huang,TY
Contributors:	薄膜技術研究中心
Keywords:	THIN-FILMS;RESIST
Date:	2002
Issue Date:	2010-07-07 15:47:55 (UTC+8)
Publisher:	中央大學
Abstract:	A bilayer bottom antireflective coating (BARC) structure composed of tetraethoxysilane (TEOS) oxide and silicon nitride film stacks is demonstrated for F-2 excimer laser (157 nm) lithography. The top TEOS oxide film is an NH3 contaminant-free material tha
Relation:	ELECTROCHEMICAL AND SOLID STATE LETTERS
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	908	View/Open

社群 sharing