In this study, Mg-doped GaN epitaxial layers were grown by metalorganic vapor phase epitaxy (MOVPE) and annealed in O-2 air and N-2. It was found that we could achieve a low-resistive p-type GaN by O-2-ambient annealing at a temperature as low as 400degre
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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
