常壓氫電漿擴散在磷化銦智切法上之研究; Blistering in InP/InGaAs/InP p-i-n strucrure via hydrogen diffusion by atmospheric pressure plasma for Ion-Cut process

NCUIR > Engineering College > Institute of Materials Science and Engineering > Electronic Thesis & Dissertation > Item 987654321/43451

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/43451

Title:	常壓氫電漿擴散在磷化銦智切法上之研究;Blistering in InP/InGaAs/InP p-i-n strucrure via hydrogen diffusion by atmospheric pressure plasma for Ion-Cut process
Authors:	蔡勖升;Hsu-sheng Tsai
Contributors:	材料科學與工程研究所
Keywords:	常壓電漿;智切法;磷化銦;InP;atmospheric pressure plasma;smart cut process
Date:	2010-07-05
Issue Date:	2010-12-08 13:39:20 (UTC+8)
Publisher:	國立中央大學
Abstract:	常壓氫電漿擴散在磷化銦智切法上之研究 Blistering in InP/InGaAs/InP p-i-n strucrure via hydrogen diffusion by atmospheric pressure plasma for Ion-Cut process
Appears in Collections:	[Institute of Materials Science and Engineering] Electronic Thesis & Dissertation

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