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    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/43453

    Title: 第三元素對於鎳矽化物形成於矽及矽碳基板之影響;Effects of Third Element on Nickel Silicidation with Si/Si1-yCy Substrates
    Authors: 黃仕賢;Shih-Hsien Huang
    Contributors: 材料科學與工程研究所
    Keywords: 熱穩定性;矽碳磊晶層;;矽化物;;Aluminium;Silicide;Nickel;Epi-SiC;Thermal stability
    Date: 2010-07-07
    Issue Date: 2010-12-08 13:39:25 (UTC+8)
    Publisher: 國立中央大學
    Abstract: 第三元素對於鎳矽化物形成於矽及矽碳基板之影響 Effects of Third Element on Nickel Silicidation with Si/Si1-yCy Substrates
    Appears in Collections:[材料科學與工程研究所 ] 博碩士論文

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