Nanomechanical properties of AlN(103) thin films by nanoindentation

NCU Institutional Repository > 工學院 > 機械工程學系 > 期刊論文 > Item 987654321/50124

請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/50124

題名:	Nanomechanical properties of AlN(103) thin films by nanoindentation
作者:	Jian,SR;Chen,GJ;Jang,JSC;Lai,YS
貢獻者:	機械工程學系
關鍵詞:	TRANSMISSION ELECTRON-MICROSCOPY;NANOCRYSTALLINE METALS;INDENTATION;DEFORMATION;HARDNESS;NITRIDE;CRYSTAL;ALN
日期:	2010
上傳時間:	2012-03-27 17:03:58 (UTC+8)
出版者:	國立中央大學
摘要:	In this study, the crystalline structure, surface roughness and nanomechanical properties of AlN thin films are investigated by using X-ray diffraction (XRD), atomic force microscopy (AFM) and nanoindentation techniques. The AlN thin films were deposited on Si(1 0 0) substrates with various sputtering powers by means of the radio frequency (RF) magnetron sputtering system. XRD results show that the crystalline structures and orientations of the AlN thin films have the strong (1 0 3) orientations. Both of the average grain size and surface roughness of AlN(1 0 3) thin films exhibit an increasing trend with the sputtering power. In addition, the hardness and Young's modulus of AlN(1 0 3) thin films increased as the sputtering power increased from 150 to 350W, with the larger results being obtained at 350W. (c) 2009 Elsevier B.V. All rights reserved.
關聯:	JOURNAL OF ALLOYS AND COMPOUNDS
顯示於類別:	[機械工程學系] 期刊論文

文件中的檔案:

檔案	描述	大小	格式	瀏覽次數
index.html		0Kb	HTML	362	檢視/開啟

在NCUIR中所有的資料項目都受到原著作權保護.

社群 sharing