Excitation of surface plasma wave at TiN/air interface in the Kretschmann geometry

NCU Institutional Repository > 理學院 > 光電科學與工程學系 > 期刊論文 > Item 987654321/51029

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/51029

题名:	Excitation of surface plasma wave at TiN/air interface in the Kretschmann geometry
作者:	Chen,NC;Lien,WC;Liu,CR;Huang,YL;Lin,YR;Chou,C;Chang,SY;Ho,CW
贡献者:	光電科學與工程學系
关键词:	INDIUM TIN OXIDE;RAY PHOTOELECTRON-SPECTROSCOPY;PULSED-LASER DEPOSITION;TITANIUM NITRIDE FILMS;LIGHT-EMITTING-DIODES;EPITAXIAL-GROWTH;THIN-FILMS;OPTICAL-PROPERTIES;RESONANCE BIOSENSOR;DIELECTRIC FUNCTION
日期:	2011
上传时间:	2012-03-27 18:16:04 (UTC+8)
出版者:	國立中央大學
摘要:	Since titanium nitride appears golden and has a high conductivity, the possibility that it can be used in surface plasma wave applications in a manner similar to gold but with very strong scratch-resistance, is of interest. This work considers this possibility using the Kretschmann configuration, measuring the angle-dependent reflectivity as well as the wavelength-dependent reflectivity. Both sets of results demonstrate the excitation of a surface plasma wave at the TiN/air interface by an incident p-wave. The thickness of TiN that most efficiently couples the incident p-wave to the surface plasma wave is around 35 nm. All of the experiments are accompanied by corresponding numerical simulations. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3549732]
關聯:	JOURNAL OF APPLIED PHYSICS
显示于类别:	[光電科學與工程學系] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	624	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing