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    题名: Excitation of surface plasma wave at TiN/air interface in the Kretschmann geometry
    作者: Chen,NC;Lien,WC;Liu,CR;Huang,YL;Lin,YR;Chou,C;Chang,SY;Ho,CW
    贡献者: 光電科學與工程學系
    关键词: INDIUM TIN OXIDE;RAY PHOTOELECTRON-SPECTROSCOPY;PULSED-LASER DEPOSITION;TITANIUM NITRIDE FILMS;LIGHT-EMITTING-DIODES;EPITAXIAL-GROWTH;THIN-FILMS;OPTICAL-PROPERTIES;RESONANCE BIOSENSOR;DIELECTRIC FUNCTION
    日期: 2011
    上传时间: 2012-03-27 18:16:04 (UTC+8)
    出版者: 國立中央大學
    摘要: Since titanium nitride appears golden and has a high conductivity, the possibility that it can be used in surface plasma wave applications in a manner similar to gold but with very strong scratch-resistance, is of interest. This work considers this possibility using the Kretschmann configuration, measuring the angle-dependent reflectivity as well as the wavelength-dependent reflectivity. Both sets of results demonstrate the excitation of a surface plasma wave at the TiN/air interface by an incident p-wave. The thickness of TiN that most efficiently couples the incident p-wave to the surface plasma wave is around 35 nm. All of the experiments are accompanied by corresponding numerical simulations. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3549732]
    關聯: JOURNAL OF APPLIED PHYSICS
    显示于类别:[光電科學與工程學系] 期刊論文

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