以減壓蒸發法回收光阻廢液之可行性探討-以某化學材料製造廠為例

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题名:	以減壓蒸發法回收光阻廢液之可行性探討-以某化學材料製造廠為例
作者:	羅羽晴;lo,yu-ching
贡献者:	環境工程研究所在職專班
关键词:	廢光阻液;光阻劑;真空減壓;氣相露點溫度;waste photo resist liquid;photo resist;vacuum decompression;gas phase dew-point temperature
日期:	2014-07-21
上传时间:	2014-10-15 17:21:40 (UTC+8)
出版者:	國立中央大學
摘要:	本研究之化學材料廠所生產之光阻劑所含溶劑－丙二醇單甲醚乙酸酯（PGMEA）、丙二醇甲醚（PGME）、水份（H2O）及環己酮（Anone），以相容性及以不同的混合比例進行試驗，發現PGME之水份含量5%以上，在不同的壓力下，會產生二個不同的氣相露點溫度，因而決定廢光阻液原料之水份需控制在5%以下；然後再依據產品規格決定黏度及UV比值(279 nm/348 nm)為進料檢查控管項目。以1 torr、3 torr、5 torr、10 torr、15 torr、20 torr之真空操作壓力，分別試驗PGMEA、PGME、水分、Anone之氣相露點溫度，實驗結果顯示PGMEA及Anone於不同壓力下之氣相露點溫度太接近，故排除含有Anone之廢光阻液為試驗材料。再依製程能力及操作溫度之考量，決定以15 torr及10 torr之真空壓力以及製程溫度設定為40 ℃及42 ℃進行模廠試驗。試驗結果顯示回收設備設定真空壓力10 torr以及操作溫度42 ℃，廢光阻液可有效去除全部溶劑並達濃縮效果；然後再以PGMEA、酚醛樹脂及光敏劑調整配方試驗8批廢光阻液，均可達原生光阻之品質標準。 ;The research tests the chemical factory produced photo resist containing PGMEA, PGME, H2O and Anone in the same consistency and different mixing ratios, and finds out that PGME has water content more than 5% while under different pressures, there will be two different gas phase dew-point temperatures, thus the water content of waste photo resist liquid raw material shall be controlled under 5%; then it determines viscosity and UV ratio (279 nm/348 nm) according to product specification as a feed inspection and control item. The research takes operational vacuum pressure of 1 torr, 3 torr, 5 torr, 10 torr, 15 torr and 20 torr to test the gas phase dew-point temperatures of PGMEA, PGME, water and Anone respectively. The experimental result shows that the gas phase dew-point temperatures of PGMEA and Anone in different pressure are too close, thus waste photo resist liquid containing Anone is exclude from the test. In further consideration of processing ability and operation temperature, it determines to take vacuum pressure of 15 torr and 10 torr and set the processing temperature at 40 ℃ and 42 ℃ to conduct simulation experiment. The experimental result shows that when the recovery plant sets vacuum pressure at 10 torr and operation temperature at 42℃, waste photo resist liquid can effectively remove all solvent and realize concentration effect. And then it takes PGMEA, phenolic resin and photo sensitizer to adjust the formula and test 8 batches of waste photo resist liquid, which can all achieve original photo resist quality standard.
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