本論文將介紹在射頻磁控濺鍍系統中加入離子輔助法(IAD)製鍍紫外光區(300~400nm)之氧化鋁(Al2O3)及氧化矽(SiO2)之光學薄膜，主要探討離子輔助法對於薄膜折射率、消光係數、穿透率等光學特性之影響，以及薄膜之結晶性，微觀結構表面粗糙鍍之分析，製鍍出一高品質之光學薄膜(高穿透、低吸收)，進而能將此材料作疊加設計，以便於提供UV雷射、太空或遙測光學技術方面之應用。 The study of Al2O3 and SiO2 optical thin films prepared by RF magnetron sputtering system with IAD was concerned in this thesis. Due to IAD, we can see the change on optical properties including refractive index、extinction coefficient and transmittance along with micro correction on structure and surface roughness. We can get optical films of better optical properties with IAD. Base on this, we use Al2O3 and SiO2 as relatively high and low refractive index materials to prepare multi-layer coatings for the applications on UV laser、 space and remote sensing technique.
