離子助鍍對二氧化鈦光觸媒薄膜之研究;Research on the photocatalytic of TiO2 films using ion-beam assisted deposition

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/7029

Title:	離子助鍍對二氧化鈦光觸媒薄膜之研究;Research on the photocatalytic of TiO2 films using ion-beam assisted deposition
Authors:	劉又齊;Yiu-Chi Liu
Contributors:	光電科學研究所
Keywords:	二氧化鈦;光觸媒;離子助鍍;TiO2;photocatalytic;ion-beam
Date:	2008-06-30
Issue Date:	2009-09-22 10:35:17 (UTC+8)
Publisher:	國立中央大學圖書館
Abstract:	二氧化鈦在太陽能電池、消毒殺菌、分解污染物、表面自潔等方面皆有廣泛應用，但其使用波長侷限在紫外光。在親水性實驗中，本實驗使用解離電壓40V之離子助鍍得到比沒有離子助鍍有效的二氧化鈦光觸媒，接觸角在照射紫外光五分鐘後達到十度以下。並在氮氣離子助鍍的實驗中，為了研究氮氣在二氧化鈦膜中之鍵結，我們以XPS量測N訊號，並且測到396eV之氮氣鍵結訊號;並以可見光照射光觸媒，照射一個小時後，接觸角降至20度，並在兩個小時後下降到10度以下。TiO2 has diverse functional application in solar cell, sterilization, degradation of organic pollutants and self-cleaning, however, the photocatalytic activities of titanium dioxide can effectively work only under ultraviolet (UV) light irradiation. In the hydrophilicity experiment, we get better photocatalytic activities films in using ion assisted deposition under anode voltage 40V than without using ion assisted deposition, after the UV light treatment 5 minutes, the contact angle was less than 10 degree. Besides, in the N2 ion assisted deposition experiment, to investigate N state in TiO2-xNx, and found that, the XPS peak at 396eV of N binding signal is clear observed .After the visible light treatment for one hour, the contact angle was 20 degree, and after the visible light treatment for two hours, the contact angle was less than 10 degree.
Appears in Collections:	[Graduate Institute of Optics and Photonics] Electronic Thesis & Dissertation

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