本研究利用干涉效應結合差動共焦顯微術，稱為Mirau干涉共焦術，實現了高縱向解析度的表面階高量測。選用三種階高試片：170nm，50nm，29nm；由實驗量測結果證實，本系統大大提高光強度與縱向位移反應曲線的斜率到5.5/um，此數值優於差動共焦顯微術反應曲線的斜率1/um。並以干涉位移法做比對，來計算干涉條紋位移量，相互驗證量測差異量小於2nm內。更進一步去修正實驗方法，能夠從一張掃描光強圖立即得到縱向反應曲線，來做光強度–階高換算，比較傳統式共焦顯微術，真正達到快速掃描。 Study the effect of interference to combine differential confocal microscopy, called Mirau interference confocal microscopy, has realized the high vertical high quantity of surface steps of analyzing degree is examined. Select three kinds of steps for measure vertical-high: 170nm, 50nm, 29nm; Examine by experiment amount result verify system this raise intensity and vertical displacement react, number value this superior to differential confocal microscopy is it react 1 slope of curve / m to learn altogether. And do it than correctly by interfering the displacement law, to calculate and interfere the displacement amount of stripe, each other in the amount of difference examined of the proving amount is smaller than 2nm. Go still one step further to revise the experiment method, can scan the only strong picture to receive the vertical response curve from one immediately, is it make intensity to be steps high to convert to come, traditional type the confocal microscopy is learnt, really up to the fast scanning altogether.
