本計畫係為前一期科技部計畫（計畫名稱：光學駐波偵測技術開發及應用）之延續，目的是在開發一種「光學駐波偵測技術」，並應用於各種機械參數的量測。工業製程現場中，各種儀器機械的相對位置與機件對位，均需要高靈敏的感測或量測技術，以達到高精確度的要求。因此，量測技術扮演著舉足輕重的角色。光學干涉儀與光學尺是常見的位移量測工具，但仍存有體積過大、死徑誤差以及光柵週期精度等問題。有鑑於此，本計畫提出一種新的位移偵測技術：「光學駐波偵測技術」，以解決現有量測工具所面臨的問題。光學駐波可藉由重疊兩道相向傳遞的光線而產生；而此駐波光場的分佈就如同一把懸浮在空間中的光學「尺」，其刻度是波長的等級，相當精密。本計畫將開發「奈米鋪球散射板」，以及「部分透明光偵測器」來量測空間中光學駐波的分佈情況。我們將依序完成：1. 建立散射式駐波觀測及量測系統，並透過偏振相位正交技術，完成物件位移量測技術。此部分已於前一期計畫中完成，研究成果已發表在著名國際期刊 Optics Express 2017;2. 設計與製作可偵測駐波之部分透明光偵測器，並開發偏振相位解析技術與外差調制解調技術，完成物件位移量測與精密定位；3. 開發以駐波偵測為基礎的矽穿孔深度量測技術。本計畫所開發之「光學駐波偵測技術」，將可縮小量測系統體積，解決干涉儀死徑誤差問題；預期在位移、機械定位與晶圓矽穿孔深度上有奈米等級的量測解析度。 ;This is a continuing project and aims at developing the "detection technique of the optical standing wave", and applying it to the measurement of the mechanical parameters. In the industrial manufacturing, it is highly required that the mechanical parameters, such as the positioning of the machines or machine parts have to be great precision. Therefore, the metrology or measurement plays essential role in industry. The optical interferometer and linear encoder have been widely used for the measurements. However, both of them suffer some troubles. For example, the size of the optical interferometer is too large to use in some applications, and its dead path error is not easy to avoid. In addition, the thermal drift of the grating pitch of the linear encoder always disturbs the measurement precision.To solve these problems and achieve the objective of this project, the "detection technique of the optical standing wave" for the displacement measurement is proposed.An optical standing wave is formed by the superposition of two waves of the same frequency propagating in opposite directions. The optical field of the optical standing wave likes a ruler, and the ruler has the wavelength scale. In this project, we are going to develop the detection technique of the optical standing wave. The developing items and the applications are as follows: 1. Creating the observation system of standing wave by nanosphere scattering plate and applying it to the displacement measurement with the polarization-phase-quadrature method. This first target had been completed in the previous project, and the researching achievements had been published in the high impact factor journal Optics Express 2017. 2. Creating the partially transparent photodiode, and applying it to the displacement measurement and positioning with the heterodyne modulation and demodulation techniques.3. Developing the depth measurement technique of the through-silicon via with the optical standing wave detection. The detection technique of the optical standing wave in this project is expected to reduce the size of the measurement system, and solve the problem of the dead path error of the interferometer. We estimate that this detection technique will provide the nanometeric resolution for the measurement of the displacement, positioning, and depth of through-silicon via.
