疏水膠體液滴的蒸發及沉積物:溫度與表面活性劑的影響

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題名:	疏水膠體液滴的蒸發及沉積物:溫度與表面活性劑的影響
作者:	賴冠霖;Lai, Kuan-Lin
貢獻者:	能源工程研究所
關鍵詞:	液滴蒸發;噴墨列印;疏水;加熱基板;表面活性劑;droplet evaporation;inkjet printing;hydrophobic;heated substrate;surfactant
日期:	2024-12-19
上傳時間:	2025-04-09 17:20:45 (UTC+8)
出版者:	國立中央大學
摘要:	液滴蒸發的現象不僅限於日常生活，在多項領域如: 噴墨列印、刑偵鑑識、醫學診斷、疾病散佈、DNA陣列、農藥噴灑、薄膜塗層、噴霧冷卻、電子設備冷卻都有應用。對於噴墨列印、薄膜塗層等應用中，在疏水表面不易獲得平坦的沉積物，這會造成產品表面品質下降。以往溫度與表面活性劑對液滴在親水表面上的研究有助於沉積物變得更為平坦，從而抑制咖啡環效應。較少有研究針對疏水液滴是如何受到溫度與表面活性劑交互作用影響。本研究探討不同基板溫度(27, 50, 70˚C)與在臨界膠束濃度(critical micelle concen-tration，CMC)以下的不同表面活性劑濃度(0, 0.025, 0.05, 0.15wt%)對膠體液滴在疏水表面的蒸發過程與最終沉積物的影響。在低濃度(0, 0.025wt%)下，沉積物顯得特別高起，甚至容易剝落。在高濃度(0.05, 0.15wt%)條件下，沉積物趨於平坦。溫度對沉積物的影響相對較小，其中表面活性劑0.15wt%，基板溫度27˚C的條件能得到最平坦的沉積物。 ;The phenomenon of droplet evaporation is not only limited to daily life but also has applications in various fields such as inkjet printing, forensic science, medical diagnostics, disease spread, DNA arrays, pesticide spraying, thin film coatings, spray cooling, and electronic device cooling. In applications like inkjet printing and thin film coatings, achieving a flat deposition on hydrophobic surfaces is challenging, which can lead to a decline in product surface quality. Previous studies on the effects of temperature and surfactants on droplets on hydrophilic surfaces have helped make depositions flatter, thereby suppressing the coffee ring effect. However, there has been less research on how the interaction of temperature and surfactants influences hydrophobic droplets. This study investigates the effects of different substrate temperatures (27, 50, 70 °C) and various surfactant concentrations (0, 0.025, 0.05, 0.15 wt%) below the critical micelle concentration (CMC) on the evaporation process of colloidal droplets on hydrophobic surfaces and the resulting depositions. At low concentrations (0, 0.025 wt%), the depositions appear particularly elevated and are prone to peeling off. The depositions tend to be flatter under high concentration conditions (0.05, 0.15 wt%). The influence of temperature on the deposits is relatively minor; Among the conditions, the flattest deposits were obtained with a surfactant concentration of 0.15wt% and a substrate temperature of 27˚C.
顯示於類別:	[能源工程研究所 ] 博碩士論文

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