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    <title>DSpace community: 薄膜技術研究中心</title>
    <link>https://ir.lib.ncu.edu.tw/handle/987654321/18632</link>
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      <title>Optical properties of dielectric thin films including quantum dots</title>
      <link>https://ir.lib.ncu.edu.tw/handle/987654321/50654</link>
      <description>title: Optical properties of dielectric thin films including quantum dots abstract: Depending on the minimum size of their micro/nanostructure, thin films can exhibit very different behaviors and optical properties. From optical waveguides down to artificial anisotropy, through diffractive optics and photonic crystals, the application changes when decreasing the minimum feature size. Rigorous electromagnetic theory can be used to model most of the components, but, when the size is a few nanometers, quantum theory also has to be used. The materials, including quantum structures, are of particular interest for many applications, in particular for solar cells because of their luminescent and electronic properties. We show that the properties of electrons in periodic and nonperiodic multiple quantum well structures can be easily modeled with a formalism similar to that used for multilayer waveguides. The effects of different parameters, in particular the coupling between wells and well thickness dispersion, on possible discrete energy levels or the energy band of electrons and on electron wave functions are given. When such quantum confinement appears, the spectral absorption and extinction coefficient dispersion with wavelength are modified. The dispersion of the real part of the refractive index can be deduced from the Kramers-Kronig relations. Associated with homogenization theory, this approach gives a new model of the refractive index for thin films including quantum dots. The bandgap of ZnO quantum dots in solution obtained from the absorption spectrum is in good agreement with our calculation. (C) 2010 Optical Society of America
&lt;br&gt;</description>
      <pubDate>Tue, 27 Mar 2012 09:50:20 GMT</pubDate>
    </item>
    <item>
      <title>Microstructure and optical properties of Al(2)O(3) prepared by oblique deposition using microsphere shell templates</title>
      <link>https://ir.lib.ncu.edu.tw/handle/987654321/50652</link>
      <description>title: Microstructure and optical properties of Al(2)O(3) prepared by oblique deposition using microsphere shell templates abstract: We fabricated an orderly inclined Al(2)O(3) column array using a hollow microsphere template. The microstructure and optical properties were investigated with scanning electron micrography and a UV/VIS spectrometer, respectively. Microsphere shell templates were formed using atomic layer deposition to prevent the melting of polystyrene microspheres during the following high-temperature deposition process. An inclined Al(2)O(3) column array with a 30 degrees tilt angle was grown by oblique deposition on a substrate with a 75.5 degrees tilt angle with respect to the substrate normal. Birefringence and photonic crystalline behavior can be observed in the orderly inclined column array. The difference in the refractive indices between the p and s polarizations of the orderly inclined Al(2)O(3) column array was about 0.1. The photonic properties of the crystal were enhanced compared to those of substrates without patterns. (C) 2011 Optical Society of America
&lt;br&gt;</description>
      <pubDate>Tue, 27 Mar 2012 09:50:17 GMT</pubDate>
    </item>
    <item>
      <title>Low alkaline contamination bilayer bottom antireflective coatings in F-2 excimer laser lithography</title>
      <link>https://ir.lib.ncu.edu.tw/handle/987654321/35685</link>
      <description>title: Low alkaline contamination bilayer bottom antireflective coatings in F-2 excimer laser lithography abstract: A bilayer bottom antireflective coating (BARC) structure composed of tetraethoxysilane (TEOS) oxide and silicon nitride film stacks is demonstrated for F-2 excimer laser (157 nm) lithography. The top TEOS oxide film is an NH3 contaminant-free material tha
&lt;br&gt;</description>
      <pubDate>Wed, 07 Jul 2010 07:47:55 GMT</pubDate>
    </item>
    <item>
      <title>Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm</title>
      <link>https://ir.lib.ncu.edu.tw/handle/987654321/35684</link>
      <description>title: Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm abstract: Single layer lanthanum fluoride (LaF3) at 193 nm was deposited by a molybdenum boat evaporation process. Various microstructures that formed under different substrate temperatures and with deposition rates were investigated. The relation between these mic
&lt;br&gt;</description>
      <pubDate>Wed, 07 Jul 2010 07:47:54 GMT</pubDate>
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