The deviation of growth model for transparent conductive graphene

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題名:	The deviation of growth model for transparent conductive graphene
作者:	李孟錡;Chan, Shih-Hao;Chen, Jia-Wei;Chen, Hung-Pin;Wei, Hung-Sen;Li, Meng-Chi;Chen, Sheng-Hui;Lee, Cheng-Chung;Kuo, Chien-Cheng
貢獻者:	光電科學研究中心
關鍵詞:	Chemical vapor deposition;Chemistry and Materials Science;Curve fitting;Deviation;Flow rates;Flow velocity;Graphene;Hydrogen;Light penetration;Materials Science;Metal foils;Molecular Medicine;Nano Express;Nanochemistry;Nanoscale Science and Technology;Nanotechnology;Nanotechnology and Microengineering
日期:	2014-01-01
上傳時間:	2026-04-23 11:22:18 (UTC+8)
出版者:	Springer New York;New York: Springer New York
摘要:	摘要： An approximate growth model was employed to predict the time required to grow a graphene film by chemical vapor deposition (CVD). Monolayer graphene films were synthesized on Cu foil at various hydrogen flow rates from 10 to 50 sccm. The sheet resistance of the graphene film was 310Ω/□ and the optical transmittance was 97.7%. The Raman intensity ratio of the G-peak to the 2D peak of the graphene film was as high as ~4 when the hydrogen flow rate was 30 sccm. The fitting curve obtained by the deviation equation of growth model closely matches the data. We believe that under the same conditions and with the same setup, the presented growth model can help manufacturers and academics to predict graphene growth time more accurately. 其他題名： Nanoscale Res Lett 出版者： New York: Springer New York 出版日期： 2014-10-20 出處： Nanoscale research letters, 2014-10, Vol.9 (1), p.581-581, Article 581 資源來源： Publicly Available Content Database 版權： Chan et al.; licensee Springer. 2014. This article is published under license to BioMed Central Ltd. This is an Open Access article distributed under the terms of the Creative Commons Attribution License ( ), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly credited. 版權： Copyright Springer Nature B.V. Dec 2014 版權： Copyright © 2014 Chan et al.; licensee Springer. 2014 Chan et al.; licensee Springer. 識別號： ISSN: 1556-276X 識別號： ISSN: 1931-7573 識別號： EISSN: 1556-276X 識別號： DOI: 10.1186/1556-276X-9-581 識別號： PMID: 25364316
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