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| 題名: | Application of nitrogen plasma immersion ion implantation to titanium nasal implants with nanonetwork surface structure |
| 作者: | 李勝偉;Sun, Ying-Sui;Zhang, Lan;Zhu, Hongqin;Yang, Wei-En;Lan, Ming-Ying;Lee, Sheng-Wei;Huang, Her-Hsiung |
| 貢獻者: | 工學院材料科學與工程研究所 |
| 關鍵詞: | 60 APPLIED LIFE SCIENCES;ANODIZATION;BLOOD;ELECTROCHEMISTRY;ENGINEERING;HUMAN POPULATIONS;IMPLANTS;ION IMPLANTATION;MORPHOLOGY;NANOSTRUCTURES;NITROGEN;NOSE;PLASMA;ROUGHNESS;SURFACES;THICKNESS;THIN FILMS;TITANIUM;TITANIUM NITRIDES;WETTABILITY |
| 日期: | 2016-07-01 |
| 上傳時間: | 2026-04-23 11:28:42 (UTC+8) |
| 出版者: | AVS Science and Technology Society;United States |
| 摘要: | 摘要： In nasal reconstruction, the response of cells to titanium (Ti) implants is mainly determined by surface features of the implant. In a pilot study, the authors applied electrochemical anodization to Ti surfaces in an alkaline solution to create a network of nanoscale surface structures. This nanonetwork was intended to enhance the responses of primary human nasal epithelial cell (HNEpC) to the Ti surface. In this study, the authors then treated the anodized, nanonetwork-structured Ti surface using nitrogen plasma immersion ion implantation (NPIII) in order to further improve the HNEpC response to the Ti surface. Subsequently, surface characterization was performed to elucidate morphology, roughness, wettability, and chemistry of specimens. Cytotoxicity, blood, and HNEpC responses were also evaluated. Our results demonstrate that NPIII treatment led to the formation of a noncytotoxic TiN-containing thin film (thickness <100 nm) on the electrochemically anodized Ti surface with a nanonetwork-structure. NPIII treatment was shown to improve blood clotting and the adhesion of platelets to the anodized Ti surface as well as the adhesion and proliferation of hNEpC. This research spreads our understanding of the fact that a TiN-containing thin film, produced using NPIII treatment, could be used to improve blood and HNEpC responses to anodized, nanonetwork-structured Ti surfaces in nasal implant applications.
出版者： United States
出版日期： 2016-07-01
出處： Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-07, Vol.34 (4)
資源來源： AIP Journals CAUL Collection
版權： American Vacuum Society
識別號： ISSN: 0734-2101
識別號： EISSN: 1520-8559
識別號： DOI: 10.1116/1.4953409
識別號： CODEN: JVTAD6 |
| 顯示於類別: | [材料科學與工程研究所 ] 期刊論文
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