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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/104847


    題名: Graphene reduction dynamics unveiled
    作者: 蘇清源;Tsai, Hung-Chieh;Shiu, Hung-Wei;Chuang, Min-Chiang;Chen, Chia-Hao;Su, Ching-Yuan;David White, Jonathon;Yen Woon, Wei
    貢獻者: 工學院能源工程研究所
    關鍵詞: Carbon-carbon composites;Chemical vapor deposition;Constraining;defects;Dynamics;Graphene;Lithography;photoelectron spectroscopy;Rate constants;Reduction;scanning probe lithography
    日期: 2015-08-06
    上傳時間: 2026-04-23 11:59:41 (UTC+8)
    出版者: IOP Publishing Ltd.;IOP Publishing
    摘要: 摘要: The reduction dynamics of micron-sized defects created on chemical vapor deposition- (CVD) grown graphene through scanning probe lithography (SPL) is reported here. CVD-grown graphene was locally oxidized using SPL and subsequently reduced, making use of a focused beam of soft x-rays. During this whole process, the reduction dynamics was monitored using a combination of micro-Raman spectroscopy ( -RS) and micro-x-ray photoelectron spectroscopy ( -XPS). After x-ray reduction, the graphene film was found to be chemically identical ( -XPS) but structurally different ( -RS) from the original graphene. During reduction the population of C-C bonds was found to first increase dramatically and then decrease exponentially. By modeling the dynamics of the C=O → C-O → C-C → C=C reduction process with four coupled-rate equations and three rate constants, the conversion from C-C to C=C bonds was found to be the limiting rate.
    其他題名: TDM
    其他題名: 2D Mater
    出版者: IOP Publishing
    出版日期: 2015-08-06
    出處: 2d materials, 2015-08, Vol.2 (3), p.31003
    資源來源: Institute of Physics Journals
    版權: 2015 IOP Publishing Ltd
    識別號: ISSN: 2053-1583
    識別號: EISSN: 2053-1583
    識別號: DOI: 10.1088/2053-1583/2/3/031003
    顯示於類別:[能源工程研究所 ] 期刊論文

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