AVS Science and Technology Society;United States: American Vacuum Society
摘要:
摘要： Nanosphere lithography and antireflection coating techniques have been applied to fabricate wide-angle antireflection structures on multicrystalline silicon substrates. Self-assembled 550-nm SiO2 nanospheres were arranged periodically to act as a mask to block the inductively coupled plasma dry etching and form bulletlike nanostructures on the surface of the multicrystalline silicon wafer. Then a 65-nm-thick zinc oxide film was deposited on the nanostructures using the atomic layer deposition method. The results show that when applying the nanostructure with a ZnO film the average reflectivity of the multicrystalline silicon wafer can be decreased from 36% to 0.65% in the wavelength range from 400 nm to 850 nm for an incident angle of 8°. When the incident angle reaches 60° the average reflectivity of the sample becomes less than 4.6%. 出版者： United States: American Vacuum Society 出版日期： 2012-01-01 出處： Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, 2012-01, Vol.30 (1), p.01A141-01A141-5 資源來源： AIP Journals (American Institute of Physics) 版權： American Vacuum Society 版權： 2012 American Vacuum Society 識別號： ISSN: 0734-2101 識別號： ISSN: 1553-1813 識別號： EISSN: 1520-8559 識別號： DOI: 10.1116/1.3666040 識別號： CODEN: JVTAD6
