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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/106211


    題名: 850-nm VCSELs With p-Type δ-Doping in the Active Layers for Improved High-Speed and High-Temperature Performance
    作者: 許晉瑋;Chi, Kai-Lun;Hsieh, Dan-Hua;Yen, Jia-Liang;Chen, Xin-Nan;Chen, Jason Jyehong;Kuo, Hao-Chung;Yang, Ying-Jay;Shi, Jin-Wei
    貢獻者: 資訊電機學院電機工程學系
    關鍵詞: Bandwidth;Cavity resonators;Doping;Performance evaluation;Power generation;Quantum well devices;Semiconductor lasers;Vertical cavity surface emitting lasers
    日期: 2016-11-01
    上傳時間: 2026-04-23 13:13:40 (UTC+8)
    出版者: Institute of Electrical and Electronics Engineers Inc.;IEEE
    摘要: 摘要: In this paper, we study the influence of p-type modulation doping on the dynamic/static performance of high-speed 850-nm VCSELs with highly strained multiple quantum wells. The studied device structure has a 3/2 λ asymmetric cavity design, which can let the internal transit time of injected carriers be as short as that of 1/2 λ cavity design and further improve its performance in terms of speed and output power for high single-mode operation. Our proposed VCSEL structure with p-type doping shows superior modulation speed with an output power comparable with that of the un-doped reference device under room temperature operation. Furthermore, when the operating temperature reaches 85 °C, there is a significant improvement in both the modulation speed and maximum power of the p-doped structures. According to our simulation, this can be attributed to the change in the quasi-Fermi levels of the injected carriers after the addition of p-doping in the active layers, which minimizes the electron leakage under high-temperature operation.
    其他題名: JQE
    出版者: IEEE
    出版日期: 2016-11
    出處: IEEE journal of quantum electronics, 2016-11, Vol.52 (11), p.1-7
    資源來源: IEEE Electronic Library (IEL)
    識別號: ISSN: 0018-9197
    識別號: EISSN: 1558-1713
    識別號: DOI: 10.1109/JQE.2016.2611439
    識別號: CODEN: IEJQA7
    顯示於類別:[電機工程學系] 期刊論文

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