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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/107064


    題名: Direct measurement of defect and dopant abruptness at high electron mobility ZnO homojunctions
    作者: 姚毓峰;Foster, G. M.;Faber, G.;Yao, Y.-F.;Yang, C. C.;Heller, E. R.;Look, D. C.;Brillson, L. J.
    貢獻者: 資訊電機學院電機工程學系
    關鍵詞: Applied physics;Buffer layers;Cathodoluminescence;Electrical properties;Electron mobility;Epitaxial growth;Hall effect;Homojunctions;Molecular beam epitaxy;Photovoltaic cells;Specific heat;Spectroscopy;Spectrum analysis;Zinc oxide
    日期: 2016-10-03
    上傳時間: 2026-04-23 13:55:00 (UTC+8)
    出版者: American Institute of Physics;Melville: American Institute of Physics
    摘要: 摘要: Due to a strong Fermi-level mismatch, about 10% of the electrons in a 5-nm-thick highly Ga-doped ZnO (GZO) layer grown by molecular beam epitaxy at 250 °C on an undoped ZnO buffer layer transfer to the ZnO (Debye leakage), causing the measured Hall-effect mobility (μH) of the GZO/ZnO combination to remarkably increase from 34 cm2/V s, in thick GZO, to 64 cm2/V s. From previous characterization of the GZO, it is known that ND = [Ga] = 1.04 × 1021 and NA = [VZn] = 1.03 × 1020 cm−3, where ND, NA, and [VZn] are the donor, acceptor, and Zn-vacancy concentrations, respectively. In the ZnO, ND = 3.04 × 1019 and NA = 8.10 × 1018 cm−3. Assuming the interface is abrupt, theory predicts μH = 61 cm2/V s, with no adjustable parameters. The assumption of abruptness in [Ga] and [VZn] profiles is confirmed directly with a differential form of depth-resolved cathodoluminescence spectroscopy coupled with X-ray photoelectron spectroscopy. An anneal in Ar at 500 °C for 10 min somewhat broadens the profiles but causes no appreciable degradation in μH and other electrical properties.
    出版者: Melville: American Institute of Physics
    出版日期: 2016-10-03
    出處: Applied physics letters, 2016-10, Vol.109 (14)
    資源來源: AIP Journals (American Institute of Physics)
    版權: Author(s)
    版權: 2016 Author(s). Published by AIP Publishing.
    識別號: ISSN: 0003-6951
    識別號: ISSN: 1520-8842
    識別號: ISSN: 1077-3118
    識別號: EISSN: 1077-3118
    識別號: DOI: 10.1063/1.4963888
    識別號: CODEN: APPLAB
    顯示於類別:[電機工程學系] 期刊論文

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