Fabrication of periodic nickel silicide nanodot arrays using nanosphere lithography

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Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/29846

Title:	Fabrication of periodic nickel silicide nanodot arrays using nanosphere lithography
Authors:	Cheng SL,Lu SW,Li CH,Chang YC,Huang CK,Chen H
Contributors:	材料科學與工程研究所
Keywords:	EPITAXIAL-GROWTH;CMOS TECHNOLOGIES;OXIDE OPENINGS;THIN-FILMS;NISI2;SI;COSI2;TRANSFORMATION;NANOWIRES;MECHANISM
Date:	2006
Issue Date:	2010-07-06 15:59:15 (UTC+8)
Publisher:	中央大學
Abstract:	The interfacial reactions of the 2D-ordered nickel metal nanodots that were prepared by polystyrene nanosphere lithography (NSL) on Si substrates after different heat treatments have been investigated. Epitaxial NiSi2 nanodot arrays were found to form at
Relation:	THIN SOLID FILMS
Appears in Collections:	[Institute of Materials Science and Engineering] journal & Dissertation

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