Growth of size-tunable periodic Ni silicide nanodot arrays on silicon substrates

NCUIR > Engineering College > National Central University Department of Chemical & Materials Engineering > journal & Dissertation > Item 987654321/30411

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Title:	Growth of size-tunable periodic Ni silicide nanodot arrays on silicon substrates
Authors:	Cheng,S. L.;Lu,S. W.;Wong,S. L.;Chen,H.
Contributors:	化學工程與材料工程研究所
Keywords:	NANOSPHERE LITHOGRAPHY;CMOS TECHNOLOGIES;THIN-FILMS;FABRICATION;NISI2;MODEL
Date:	2006
Issue Date:	2010-07-06 16:18:49 (UTC+8)
Publisher:	中央大學
Abstract:	The fabrications of size-tunable periodic arrays of nickel metal and silicide nanodots on (001)Si substrates using polystyrene (PS) nanosphere lithography (NSL) and heat treatments have been investigated. The growth of epitaxial NiSi2 was found to be more
Relation:	APPLIED SURFACE SCIENCE
Appears in Collections:	[National Central University Department of Chemical & Materials Engineering] journal & Dissertation

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