Effects of ion energy on internal stress and optical properties of ion-beam sputtering Ta2O5 films

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35418

Title:	Effects of ion energy on internal stress and optical properties of ion-beam sputtering Ta2O5 films
Authors:	Tien,CL;Lee,CC
Contributors:	光電科學與工程學系
Keywords:	PHASE-SHIFTING INTERFEROMETRY;THIN-FILMS;ASSISTED DEPOSITION;REFRACTIVE-INDEX;COATINGS
Date:	2003
Issue Date:	2010-07-07 14:14:07 (UTC+8)
Publisher:	中央大學
Abstract:	The effects of ion-beam energy on the internal stress and optical properties of tantalum pentoxide (Ta2O5) thin film have been investigated. Ta2O5 thin films were deposited on unheated glass substrates by ion-beam sputter deposition (IBSD) with different
Relation:	JOURNAL OF MODERN OPTICS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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