Fabry-Perot type antireflective coatings for binary mask applications in ArF and F-2 excimer laser lithographies

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35422

Title:	Fabry-Perot type antireflective coatings for binary mask applications in ArF and F-2 excimer laser lithographies
Authors:	Chen,HL;Lee,CC;Chuang,YF;Liu,MC;Hsieh,CI;Ko,FH
Contributors:	光電科學與工程學系
Keywords:	ELECTRON-BEAM LITHOGRAPHY;NM
Date:	2003
Issue Date:	2010-07-07 14:14:16 (UTC+8)
Publisher:	中央大學
Abstract:	We demonstrated an antireflective coating structure, which is based on a three-layer Fabry-Perot structure, for binary masks of ArF (193 nm) and F-2 (157 nm) excimer laser based lithographies. The antireflective coating structure is composed of a metal/di
Relation:	ELECTROCHEMICAL AND SOLID STATE LETTERS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	535	View/Open

社群 sharing