Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/51048

Title:	Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering
Authors:	Tang,CJ;Jaing,CC;Lee,KH;Lee,CC
Contributors:	光電科學與工程學系
Date:	2011
Issue Date:	2012-03-27 18:16:42 (UTC+8)
出版者:	國立中央大學
摘要:	Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure. (C) 2011 Optical Society of America
關聯:	APPLIED OPTICS
显示于类别:	[Department of Optics and Photonics] journal & Dissertation

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