光學薄膜折射率與帶通濾光片薄膜厚度之研究;Research on the Refractive Index of Optical Thin Films and the Film Thickness of Bandpass Filters

NCUIR > Engineering College > Executive Master of Opto-Mechatronics Engineering > Electronic Thesis & Dissertation > Item 987654321/96178

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/96178

Title:	光學薄膜折射率與帶通濾光片薄膜厚度之研究;Research on the Refractive Index of Optical Thin Films and the Film Thickness of Bandpass Filters
Authors:	鍾瀞儀;Chuang, Ching-Yi
Contributors:	光機電工程研究所在職專班
Keywords:	光學薄膜;厚度;多層膜;長波通濾光片;短波通濾光片;帶通濾光片;五氧化二鉭;二氧化鈦;氫化矽;鍺;Optical film;Thickness;Multilayer film;Long wave pass filter;Short wave pass filter;Band pass filter;Ta2O5;TiO2;SiH;Ge
Date:	2024-11-22
Issue Date:	2025-04-09 16:52:58 (UTC+8)
Publisher:	國立中央大學
Abstract:	本篇論文研究是關於光學薄膜的設計，在1930年代，真空蒸鍍設備出現後，光學薄膜才真正的開始發展，之後因軍事發展所需，更加快了光學薄膜的進步速度，進步至今，光學薄膜的應用已極為廣泛，從我們最常接觸到的民生用品，再到光學通訊、半導體產業、太空科技的應用…等。伴隨著積體電路(IC)及半導體產業的蓬勃發展，人們對光學薄膜的需求及品質的要求也不斷提高，追求的是厚度越來越薄且體積越來越小，功能卻需更強大的濾光片，濾光片主要用途為選擇可透射的波長，使其通過，限制不可透射的波長，使其截止，利用多層膜的疊加做到濾光的效果。本篇論文是選用二氧化矽作為低折射率材料，再搭配五氧化二鉭、二氧化鈦、氫化矽及鍺，這四種具有不同材料特性的高折射率材料，並使用兩種設計方法，一種為長波通濾光片、短波通濾光片的合併設計，另一種為帶通濾光片，針對選用材料的區別、設計方式的差別、優化層數的不同，可做出表現各不相同的帶通濾光片，進而選用較符合需求的帶通濾光片。;This paper examines the design of optical thin films.In the 1930s,as the development of vacuum deposition equipment,the development of optical thin films truly began.After this,due to the requirements of military demands,the progress of optical thin films has been accelerated even further.Over decades of continuous innovation,the applications of optical thin films have become extremely extensive.From everyday consumer products,to the applications of optical communication,semiconductor industry,space technology,and so on... With the rapid development of integrated circuits (IC) and the semiconductor industry,demand for optical thin films and the requirements for quality are continuously increasing.There is a requirement for thinner films and smaller dimensions of powerful filters.The primary function of a filter is to allow selected wavelengths to be transmitted.While blocking other wavelengths, achieving the filtering effect through the deposition of multiple layers of film.In this study,silicon dioxide is used as the low refractive index material,combined with tantalum pentoxide,titanium dioxide,hydrogenated silicon,and germanium,as high refractive index materials.Two design methods are applied,one is the combined design of long wave pass filter and short wave pass filter, the other is the bandpass filter design.Based on the differences in material selection,design methods,and optimization of layer numbers,bandpass filters with different performances can be produced to achieve the better performance requirement.
Appears in Collections:	[Executive Master of Opto-Mechatronics Engineering] Electronic Thesis & Dissertation

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