含鈦類鑽碳電漿鍍膜材料表面改質之研究

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姓名

國治(Jyh Gwo) 查詢紙本館藏

畢業系所

機械工程學系

論文名稱

含鈦類鑽碳電漿鍍膜材料表面改質之研究
(The study of Ti-DLC surface modification of material by plasma coating)

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摘要(中)

本文係以過濾式陰極電弧法(FCVA)和高功率脈衝磁控濺鍍法(HPPMS)進行材料表面改質之研究，於電漿鍍膜製程中，以鈦金屬為陰極、C2H2為反應氣體，分別於碳化鎢(WC)、SKH51工具鋼和SUS304不銹鋼等基材表面披覆含鈦類鑽碳膜(Ti-C:H)，進行基材表面降低摩擦係數和磨耗性之表面改質並驗證FCVA製程鍍膜品質及將HPPMS製程導入耐磨耗DLC膜應用的效果。
FCVA製程以「基材偏壓」和「靶電流」的變化為實驗參數，而HPPMS製程以「基材偏壓」和「基材至靶距離」為實驗參數，透過輝光放電分光儀、掃描式電子顯微鏡、拉曼光譜儀、X光電子光譜儀、X光繞射儀及奈米壓痕試驗機、磨耗試驗機和刮痕測試機等工具，對鍍膜之組織結構及硬度、楊氏係數、摩擦係數、磨耗率、附著性等機械性質進行分析量測；以FCVA製程所得之Ti-C:H膜表面光滑，其硬度最高達18.3GPa、楊氏係數最高達180GPa、摩擦係數低於0.1、磨耗率在1.28 10-16m3/Nm以下及附著力大於4.9kg，而以HPPMS製程所得之Ti-C:H膜，其硬度最高達22.6GPa、楊氏係數最高達215GPa、摩擦係數低於0.165及附著力大於5kg;研究之結果顯示，FCVA可大幅提升鍍膜品質，可完全改善陰極真空電弧法的缺失，而以本研究FCVA及HPPMS電漿鍍膜製程於碳化鎢(WC)及SKH51工具鋼基材所披覆之Ti-C:H膜，其與基材間的附著力均優於一般使用標準，對降低摩擦係數和增加磨耗性的表面改質頗具成效。

摘要(英)

The study is to modify the material surface via Filtered Cathodic Vacuum Arcing (FAVA) and High Power Pulse Magnetron Sputtering (HPPMS). During manufacturing process of plasma coating, titaneum (Ti) is used as the negative pole while acetylene (C2H2) is used as the reaction gas. The Ti-C:H coating applies respectively on the surface of the substrate of WC & SKH51 tool steel and SUS304 stainless steel can modify the surface by reducing friction coefficient and its wearability, so as to verify the effect coating quality of FCVA, and effect of applying wearable DLC film to the manufacturing process of HPPMS.
During FCVA manufacturing process, the experimental parameters based on the variation of substrate bias and target current ,while HPPMS parameters based on substrate bias and substrate-to-target distance. The application of instruments and tools, i.e. glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), Nanoindenter, pin-on-disk tribometer and scratch tester to perform the mechanical property analytical measurements; i.e. organized structure & hardness, Young’s modulus, friction coefficient, wear rate, and adhesion ability of coating. Via FCVA manufacturing process, the surface of Ti-C:H is smooth, its maximum hardness is 18.3GPa, maximum Young’s modulus is 180GPa, friction coefficient is less than 0.1,wear rate is under 1.28 10-16m3/Nm, and adhesive force is greater than 4.9 Kg. Via HPPMS manufacturing process the result of the surface of Ti-C:H, it maximum hardness is as high as 22.6GPa, the maximum Young’s modulus is 215GPa, friction coefficient is less than 0.165, and adhesive force is greater than 5 Kg. The result of the study shows that FCVA can highly enhance the quality of coating, completely improve the flaw of Cathodic Vacuum Arcing method. By studying FCVA and HPPMS manufacturing process of plasma coating, the adhesive force between the coating layer and substrate is better than general application level, and it contributes a better result to the reduction of friction force and the growth of wearability.

關鍵字(中)

★ 類鑽碳膜

關鍵字(英)

★ DLC

論文目次

目錄
頁次
中文摘要 i
英文摘要 ii
誌謝 iii
目錄 iv
圖目錄 vii
表目錄 xi
第一章緒論 1
1-1類鑽碳膜簡介 1
1-2研究動機與目的 2
1-3研究方法 4
第二章文獻回顧 5
2-1類鑽碳膜的研究 5
2-2類鑽碳膜的應用 5
2-3類鑽碳膜的結構 6
2-4含氫量對類鑽碳膜的影響 9
2-5類鑽碳膜的成長機制 10
2-6類鑽碳膜的改質 11
2-7類鑽碳膜附著力的改善 14
2-8離子轟擊效應 15
2-9真空度 17
2-10電漿 18
2-11真空電漿 19
2-12電漿鍍膜應用 20
2-13電漿氣體選用 22
2-14薄膜製程技術 22
2-14-1應用於類鑽碳的鍍膜技術 27
2-14-2過濾式陰極真空電弧法(FCVA) 31
2-14-3高功率脈衝磁控濺鍍法(HPPMS) 32
2-15碳氫氣體選用 33
2-16類鑽碳膜的拉曼光譜分析 33
2-17鍍膜機械性質量測 35
2-17-1附著力試驗 35
2-17-2硬度試驗 38
2-17-3磨耗試驗 38
第三章實驗方法與步驟 40
3-1實驗方法 40
3-2鍍膜設計 40
3-3鍍膜試片 40
3-4陰極靶材 41
3-5實驗步驟 41
3-6實驗設備 44
第四章結果與討論 47
4-1FCVA電漿鍍膜製程披覆含鈦類鑽碳膜 47
4-1-1FCVA鍍膜品質 47
4-1-2鍍層組織成份分析 47
4-1-3鍍層鈦含量與沉積速率分析 49
4-1-4鍍層鍵結形態分析(XPS) 50
4-1-5鍍層結晶組織分析(XRD) 51
4-1-6鍍層奈米硬度測試 51
4-1-7鍍層磨耗測試 53
4-1-8鍍層附著力測試 54
4-2高功率脈衝磁控濺鍍披覆含鈦類鑽碳膜 54
4-2-1鍍層組織成份分析 55
4-2-2鍍層鈦含量沉積速率分析 55
4-2-3鍍層拉曼光譜分析 56
4-2-4鍍層結晶組織分析(XRD) 57
4-2-5鍍層奈米硬度測試 57
4-2-6鍍層磨耗測試 59
4-2-7鍍層附著力測試 59
第五章結論 62
參考文獻 117

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指導教授

李雄

審核日期

2012-3-27

推文