以自我複製技術設計及製作低損耗型波導

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姓名

陳映羽(Ying-Yu Chen) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

以自我複製技術設計及製作低損耗型波導
(Design and fabrication of Low Propagation Loss Waveguide Using Autocloning Technique)

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摘要(中)

本論文主要以自我複製技術(Autocloning technique)來製作微型化波導，並藉由有限時域差分法(Finite-Difference Time-Domain; FDTD) 來設計微型化波導以及利用電子束直寫技術製作所需的基板圖樣。
首先，使用有限時域差分法模擬自我複製型波導的堆疊方式，比較非對稱膜堆與對稱膜堆、SiO2/Ta2O5與SiO2/TiO2結構、各種週期大小、不同頂角下TE偏振各入射角度傳遞效率的優劣，與文獻中自我複製型波導傳遞效率相比，傳遞損耗下降幅度達76.4%。此外也探討結構核心層及包覆層之等效折射率與各項參數間的相關性。
在製程過程中，利用電子槍蒸鍍系統與離子源助鍍製作自我複製式波導，共37層，其厚度約為9.2 μm。在波長1520 nm~1570 nm，其傳遞損耗為0.1838dB/mm，可應用於通訊紅外光區塊，自我複製技術有著可大量生產且多層製作之特性，微型化波導則有著積體化的前瞻性，未來可望商業化應用於積體平面光路。

摘要(英)

In this research, we design and fabrication low propagation loss waveguide using by Autocloning technique. Simulation the design using by Finite-Difference Time-Domain method. Comparison of several structures, such as difference accumulation type, lattice constant, vertex angle, thickness, transverse period, and two kind of heterostructure Ta2O5/SiO2 and TiO2/SiO2, which structure can reduce the Autocloned waveguide propagation loss.
In addition, we comparing the equivalent refractive index between several structures, which has the lower propagation loss and its core and cladding actually has more difference equivalent refractive index. As the result of our design, propagation loss is reduce by over 76.4% compared with the literature.
And we have fabricated the Autocloned waveguide using electron beam gun evaporation with ion-beam-assisted depositon (IAD) successfully. The structure thin film has 37 layers, which physical thickness was 9.2μm. The Autocloned waveguide had low propagation loss about 0.1838dB/mm at 1520-1570 nm in infrared region.
Autocloning technology can be mass production, and multi-layer stack is characteristics of Autocloning technology. Integrated and miniaturization of Autocloned waveguide is forward-looking. In the future, Autocloned integrated waveguide can expected to commercial application.

關鍵字(中)

★ 光子晶體
★ 低損耗
★ 波導
★ 自我複製技術

關鍵字(英)

★ Waveguide
★ Low Propagation Loss
★ Autocloning
★ photonic crystal

論文目次

摘要 I
Abstract II
目錄 III
圖目錄 VI
表目錄 XI
第一章緒論 1
1-1背景 1
1-1-1 光通訊 1
1-1-2 光子晶體 2
1-2 研究動機 7
1-3 研究目的 8
1-4 論文架構 9
第二章基礎理論 10
2-1 波導原理 10
2-2 有限時域差分法(FINITE-DIFFERENCE TIME-DOMAIN; FDTD) 11
2-3 等效介質理論 24
2-4 自我複製結構膜成膜機制 27
第三章自我複製型波導設計 31
3-1 自我複製型波導光通區域之量化定義與討論 31
3-2 堆疊方式與傳遞損耗(PROPAGATION LOSS)常數相關性分析 38
3-2-1 堆疊方式之傳遞效率分析 38
3-2-2 堆疊方式與傳遞損耗常數分析 42
3-3 晶格常數與傳遞損耗常數相關性分析 46
3-3-1 核心層寬3μm 46
3-3-2 結構放大20%(核心層寬36μm) 47
3-3-3 結構放大10%(核心層寬33μm) 48
3-3-4 結構縮小115%(核心層寬2655μm) 49
3-4 頂角角度與傳遞損耗常數相關性分析 54
3-5 結構組成材料及結構膜厚與傳遞損耗常數相關性分析 57
3-5-1 等光學厚度 57
3-5-2 等物理厚度 63
3-6 各種結構等效折射率與傳遞損耗常數相關性分析 70
3-6-1 非對稱式與對稱式自我複製型波導等效折射率比較 70
3-6-2 結構組成Ta2O5/SiO2與TiO2/SiO2採等光學厚度設計等效折射率比較 74
3-6-3 結構組成Ta2O5/SiO2與TiO2/SiO2採等物理厚度設計等效折射率
比較 77
3-7 外圍橫向週期與傳遞損耗常數、等效折射率相關性分析 82
3-7-1外圍橫向週期與傳遞損耗常數相關性分析 82
3-7-2外圍橫向週期與等效折射率相關性分析 85
第四章自我複製型波導製作 91
4-1 基板製作 91
4-2 結構膜製程設備 95
4-3 結構膜製作 96
第五章自我複製型波導量測分析 97
5-1 量測儀器 97
5-2 元件製作結果與效率量測 99
5-3 元件製作結果之模擬分析 102
第六章結論與未來工作 105
參考文獻 106

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指導教授

李正中、陳昇暉
(Cheng-Chung Lee、Sheng-Hui Chen)

審核日期

2012-4-19

推文