使用空間載頻相位偏移技術量測薄膜的表面輪廓及厚度

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：36

、訪客IP：3.131.13.24

姓名

沈家裕(Chia-yu Shen) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

使用空間載頻相位偏移技術量測薄膜的表面輪廓及厚度
(Thickness and Surface Profile Measurement of Thin Film by Using Spatial Carrier Phase Shifting Technique)

相關論文

★ 半導體雷射控制頻率	★ 比較全反射受挫法與反射式干涉光譜法在生物感測上之應用
★ 193nm深紫外光學薄膜之研究	★ 超晶格結構之硬膜研究
★ 交錯傾斜微結構薄膜在深紫外光區之研究	★ 膜堆光學導納量測儀
★ 紅外光學薄膜之研究	★ 成對表面電漿波生物感知器應用在去氧核糖核酸及微型核糖核酸雜交反應檢測
★ 成對表面電漿波生物感測器之研究及其在生醫上的應用	★ 探討硫化鎘緩衝層之離子擴散處理對CIGS薄膜元件效率影響
★ 以反應性射頻磁控濺鍍搭配HMDSO電漿聚合鍍製氧化矽摻碳薄膜阻障層之研究	★ 掃描式白光干涉儀應用在量測薄膜之光學常數
★ 量子點窄帶濾光片	★ 以量測反射係術探測光學薄膜之特性
★ 嵌入式繼光鏡顯微超頻譜影像系統應用在口腔癌切片及活體之設計及研究	★ 軟性電子阻水氣膜之有機層組成研究

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

[檢視]

[下載]

本電子論文使用權限為同意立即開放。
已達開放權限電子全文僅授權使用者為學術研究之目的，進行個人非營利性質之檢索、閱讀、列印。
請遵守中華民國著作權法之相關規定，切勿任意重製、散佈、改作、轉貼、播送，以免觸法。

摘要(中)

本研究主要是以建立一套抗震動的相移式光學薄膜量測系統，可以量測二維的表面輪廓(Surface Profile)、薄膜光學常數和厚度，為一個非破壞性的量測系統。
本量測系統只要是為了取代偏極陣列像素遮罩法(Micro- Polarizer-Array-Pixelated Mask)的相移式光學量測系統，本實驗架設系統，具有相同的量測功能且使用的光學元件也較少。有別以往PZT相移式量測方法，可以避免環境震動的影響且同時具有橢偏儀折射率和厚度的量測功能，又可以量測表面輪廓。
本研究主要是使用空間載頻相移技術在系統中引進一個傾斜量來作為四步相位的量測方法，因此可以得到表面輪廓的資訊。利用多波長的量測方法，使用基因演算法擬合出薄膜的折射率及厚度，結果與橢偏儀比較，有很好的一致性。

摘要(英)

Our research is used to build a vibration-insensitive phase-shifting interferometer to measure optical constants of thin film. Two-dimensional surface profile, optical constants and thickness of thin film can be measured by this interferometry, which is a nondestructive measurement.
Our interferometer can replace phase-shifting interferometer, which has a micro-polarizer-array-pixelated mask placed in front of CCD. Both interferometers have the same function. But a few of optical device is used in our measurement system. Our system has the function in measuring refractive index and thickness of thin film like ellipsometer and also the surface profile additionally, and it can avoid the fluctuation of environment, different from PZT phase-shifting interferometry.
The system is based on spatial carrier phase shifting technique, a tilt is introduced to make up the four-step phase-shifting information, and therefore the surface profile can be obtained. The multi-wavelength measurement can help to solve the refractive index and thickness of thin film by fitting the reflective phase and reflectance with gene algorithm and our interferometer has almost the same quality as ellipsometer in measurement.

關鍵字(中)

★ 薄膜
★ 厚度
★ 相移
★ 表面輪廓

關鍵字(英)

★ thin film
★ thickness
★ surface profile
★ phase shift

論文目次

摘要...........................................................i
Abstract.......................................................ii
致謝.........................................................iii
圖、表錄.....................................................vii
第一章緒論....................................................1
第二章基礎理論................................................3
2-1垂直入射的基本特性..................................3
2-1-1 電磁波............................................3
2-1-2 單介面穿透與反射..................................6
2-1-3 單層膜的反射率與穿透率............................7
2-1-4 非相干性之反射與透射.............................10
第三章相移干涉原理...........................................12
3-1 波的干涉原理.......................................12
3-2 相移干涉術.........................................14
3-2-1 四步相移法 δ=π/2.................................16
3-2-2 四步相移法 δ=2α...............................16
第四章光學常數的量測法........................................18
4-1光度法.............................................19
4-1-1 Abeles 法.......................................19
4-1-2 包絡法..........................................22
4-2橢圓偏極術.........................................25
4-2-1 偏極態光波理論..................................25
第五章抗震動光學干涉儀......................................31
5-1 偏極陣列像素遮罩法................................32
5-2 空間載頻相移法....................................34
第六章實驗原理與架構........................................36
6-1 實驗原理與模擬....................................37
6-1-1 模型的建立與相位計算............................37
6-1-2 一維模擬與計算..................................41
6-1-3 二維模擬與計算..................................44
6-2 實驗儀器架構與量測原理............................48
6-2-1實驗儀器架構.....................................48
6-2-2表面輪廓的量測原理...............................49
6-2-3光學鍍膜的厚度量測原理...........................49
6-2-4 基因演算法的擬合.................................51
6-2-5實驗步驟.........................................53
6-2-5-1實驗的前置作業.................................53
6-2-5-2實驗量測步驟...................................54
第七章量測結果與討論........................................55
7-1表面輪廓的量測結果.................................55
7-2 薄膜光學常數的量測結果.............................57
第八章結論...................................................59
Conclusion....................................................60
參考文獻......................................................61

參考文獻

[1] 李正中，“薄膜光學與鍍膜技術”，第六版，藝軒出版社，台北， 2009.
[2] Malacara D., “Optical shop testing”, Wiley, New York, 18-30, 1997.
[3] Zhang T., Yamaguchi I., “Three-dimensional microscopy with phase-shifting digital holography”. Opt. Let., 23, 1221-1223, 1998.
[4] 洪文明，“白光相移干涉術之三維表面量測”，國立交通大學光電所碩士論文，2003 .
[5] Creath, K., “Phase-Measurement Interferometry Technique,” in Progress in
Optics. Vol. XXVI, E. Wolf, Ed., Elsevier Science Publishers,Amsterdam,
349-393,1988.
[6] Wyant, J. C., “Interferometry optical metrology: basic principles and new
systems,” Laser Focus, 65–71,1982.
[7] Hariharan, P., Oreb, B. F., and Eiju, T., ‘’Digital Phase-Shifting Interferometry: a Simple Error-Compensating Phase Calculation Algorithm,” Appl. Opt. 13, 2504,1987.
[8] Robinson D.W. and Reid G.T., “Interferogram Analysis”, 2nd Ed., 123-126, Institute of Physics Publishing, Bristol and Philadelphia, 1993
[9] Brock N., Hayes J., Kimbrough B., Millerd J., North-Morris, Novak M. M.& Wyant J., “Dynamic interferometry”, Proc. SPIE Int. Soc. Opt. Eng., 5875, 1, 58750F, 2005.
[10] Kimbrough B., Millerd J., Wyant J. & Hayes J., “Low Coherence Vibration Insensitive Fizeau Interferometer”, Proc. of SPIE, 6292, 62920F-1,2006.
[11] P. Carre´, ‘‘Installation et utilisation du comparateur photoelectrique et interferential du Bureau International des Poids et Me´sures,’’
Metrologia 2, 13–23 119662.
[12] Hauge P.S., “Recent Developments In Instrumentation In Ellipsometry”,Surf. Sci.96, 108, 1980.
[13] Abeles F., “Methods for determining optical parameters of thin films”, in Progress in Optics, Vol. 2, Chap. VI, ed. by Wolf E., North-Holland Publishing Company, 251-288, 1963.
[14] Manifacier J.C., Gasiot J. and Filland J.P., “Simple method for determination of the optical constant n, k and the thickness of weekly absorbing thin films”, J. Phy. E.: Sci. Inst. 9, 1002-1004, 1976.
[15] Swanepoel R., “Determination of the thickness and optical constant of amorphous silicon”, J. Phy. E.: Sci. Inst. 16, 1214-1222, 1983.
[16] 林奕德，"數值分析簡式橢偏儀中的偏光片及析光片之校正及更正"，國立交通大學光電所碩士論文，2005 .
[17] James Millerd, Neal Brock, John Hayes, Brad Kimbrough, Matt Novak, Michael North-Morris and James C. Wyanta, “Modern Approaches in Phase Measuring Metrology”, Proc. of SPIE,5856,2005.
[18] Mauro Melozzi, Luca Pezzati, and Alessandro Mazzoni,” Vibration-insensitive interferometer for on-line measurements”, APPLIED OPTICS, Vol. 34, No. 25,1995
[19] Shokooh-Saremi M., Nourian M., Mirsalehi M.M., Keshmiri S.H.,"Design of multilayer polarizing beam splitters using genetic algorithm", Optics Communications ,233,57–65, 2004.
[20] Julien Cardin, Dominique Leduc, “ Determination of refractive index, thickness, and the optical losses of thin films from prism–film coupling measurements”, Appl. Opt., Vol. 47, No. 7, March 2008.
[21] Kirkpatrick, “Optimization by Simulator Annealing: Quantitative Studies”, S.Journal of Statistical Physics, 34, 975-986, 1984.
[22] Acton F.S., “Numerical Methods That work”, corrected edition, Washington: Mathematical Association of America, 55,454-458, 1990.
[23] 吳肇元,“動態干涉儀量測薄膜之光學常數”，國立中央大學光電科學碩士論文,2009.
[24] 劉奕宏,“多波長光學常數量測之研究”，國立中央大學光電科學研究所碩士論文, 2011.

指導教授

李正中(Cheng-Chung Lee)

審核日期

2012-8-27

推文