博碩士論文 100323105 完整後設資料紀錄

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DC.contributor機械工程學系zh_TW
DC.creator李岳蒲zh_TW
DC.creatorYueh-Pu Leeen_US
dc.date.accessioned2015-1-30T07:39:07Z
dc.date.available2015-1-30T07:39:07Z
dc.date.issued2015
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=100323105
dc.contributor.department機械工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract本研究成功的證明使用氧化鐵磁性粒子與二甲基矽氧烷(PDMS)製作出磁性PDMS裝置,其為一種簡單製作且可以達到高強度的可逆磁性接合方法;在此提出了兩種磁性PDMS裝置,包括不可光學檢測的暗視野裝置與可光學檢測的明視野裝置。 研究顯示,暗視野裝置製作上類似標準的PDMS鑄造,較不受微流道幾何形狀的影響;而明視野裝置澆鑄性能與微流道幾何圖形高度有關,實驗針對微流道的佈局進行了詳細的研究,探討PDMS墊塊層與微模具基板之間的間隙大小對於製作明視野裝置的相關性。磁性PDMS裝置接合強度測試中,證明在裝置底部增加一層PDMS薄膜層可以有效改善表面粗糙度,並且有效的提升磁性PDMS的可逆磁性接合強度。測試結果顯示,有PDMS薄膜的暗視野裝置最佳接合強度為110 KPa;而有PDMS薄膜的明視野裝置最佳接合強度為81 KPa。 zh_TW
dc.description.abstractIron oxide magnetic microparticles and poly(dimethylsiloxane) (MMPs-PDMS) composite was successfully demonstrated as a simple and high-strength reversible magnetic bonding method in this study. Dark-field (optical inspection impossible) and light-field (optical inspection possible) MMPs-PDMS casting were presented. This study showed that microchannel geometries have limited influence on dark-field casting which is similar to standard PDMS casting. Light-field casting performance was highly related to microchannel geometries. Effects of the microchannel layout, and the gap between the cover-PDMS layer and micromold substrate were detail investigated. MMPs-PDMS magnetic bonding experiments showed that thin PDMS film incorporating an MMPs-PDMS layer can effectively reduce surface roughness and enhance MMPs-PDMS reversible magnetic bonding strength. A thin PDMS film-coated dark-field MMPs-PDMS device exhibited the greatest bonding strength of 110 KPa. For a light-field MMPs-PDMS device with a thin PDMS film, a magnetic bonding strength of 81 KPa can be achieved.en_US
DC.subject可逆接合zh_TW
DC.subject微流體裝置zh_TW
DC.subject磁性zh_TW
DC.title應用磁性粒子於微流體裝置之可逆接合zh_TW
dc.language.isozh-TWzh-TW
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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