博碩士論文 101328003 完整後設資料紀錄

DC 欄位 語言
DC.contributor能源工程研究所zh_TW
DC.creator盧勁甫zh_TW
DC.creatorJin-Fu Luen_US
dc.date.accessioned2014-7-15T07:39:07Z
dc.date.available2014-7-15T07:39:07Z
dc.date.issued2014
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=101328003
dc.contributor.department能源工程研究所zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract本研究利用數值分析法,模擬計算高頻RF感應加熱器應用於MOCVD承載盤,探討分析電磁感應加熱現象及承載盤溫度分布。利用數值分析法計算二維軸對稱電磁感應加熱器於承載盤所產生的加熱現象,研究結果顯示當線圈彼此間距的改變,對加熱溫度大小有所影響,承載盤溫度差會因線圈間距的增加而減小,而線圈與承載盤的距離會影響承載盤所產生的溫度大小,溫度差會因距離的增加而減小,並在固定間距的情況下,調整各別線圈與承載盤的距離,以獲得承載盤晶圓區域均勻的溫度分布,最後得出優化的線圈排列為: 線圈彼此間距為0.8cm,各別線圈與承載盤的距離分別為: 0.5cm、0.7cm、0.8cm、0.5cm、0.6cm、0.7cm下,可獲承載盤表面溫度差為2.2 K。 接續二維軸對稱的研究探討,比較二維和三維模組溫度分布不同,在三維模擬中,發現因線圈環繞方式的關係,會導致承載盤各位置電流分布皆不相同,而熱源分布受電流分布決定,且各別位置熱源分布不同導致承載盤的溫度分布有所差異,藉由加入二維優化的線圈排列有效改善承載盤的溫度差,並修正二維優化線圈的排列,最後在各別線圈與承載盤的距離分別為: 0.5cm、0.5cm、0.6cm、0.6cm、0.7cm、0.8cm下,獲得良好的溫度分布。 zh_TW
dc.description.abstractThis study uses the numerical analysis to simulate the high frequency RF induction heating for MOCVD susceptor, the phenomenon of electromagnetic induction heating and distribution of temperature on the susceptor are investigated. Using numerical analysis calculates the 2D axisymmetric model with phenomenon of electromagnetic induction heating in MOCVD susceptor, the research indicates the temperature difference is decreased with increasing space of coil turns and the temperature difference will decrease with the distance between coil and susceptor, and then the space of coil turn is fixed at 0.8 cm with adjusting the distance between coil and susceptor in order to find the uniform temperature distribution on the deposition area of wafer. In this summary, it obtains the temperature difference is only 2.2 K on the deposition area of susceptor with the distance between individual coil and susceptor are 0.5cm, 0.7cm, 0.8cm, 0.5cm, 0.6cm and 0.7cm. Following the 2D axisymmetric model, the research further compares 2D model with 3D model in electromagnetic induction heating. In the 3D model, the result discovers that by twining coil mode which will result in different current density distribution in different positions of susceptor. The current density distribution decides the distribution of heat source. Because of the different distribution of heat source that will result in different temperature distribution on the susceptor. Consequently, by using the optimized arrangement of coil in 2D model and improving the arrangement of coil that the distance between individual coil and susceptor are 0.5cm, 0.5cm, 0.6cm, 0.6cm, 0.7cm and 0.8cm for obtaining the fine temperature distribution on the susceptor. en_US
DC.subject高頻感應加熱zh_TW
DC.subject發光二極體zh_TW
DC.subject加熱器zh_TW
DC.subjectMOCVDen_US
DC.subjectRFen_US
DC.subjectHeateren_US
DC.subjectLEDen_US
DC.title高頻RF感應加熱器應用於MOCVD承載盤之均溫性探討分析zh_TW
dc.language.isozh-TWzh-TW
DC.titleAnalysis of uniform temperature distribution in MOCVD susceptor by high frequency RF induction heateren_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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