博碩士論文 102521115 完整後設資料紀錄

DC 欄位 語言
DC.contributor電機工程學系zh_TW
DC.creator梁瀅龍zh_TW
DC.creatorYing-Lung Liangen_US
dc.date.accessioned2015-6-30T07:39:07Z
dc.date.available2015-6-30T07:39:07Z
dc.date.issued2015
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=102521115
dc.contributor.department電機工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract本篇論文中,我們將帕松方程式及電流連續方程式,利用等效電路的方式來設計出二維網格數值元件模擬器,元件的模擬就變成了電路的模擬,不但可以用電路模擬器來做元件模擬,而且可以和一般電路結合,形成混階模擬,接著討論多晶矽閘極和金屬閘極的差異和優缺點,並利用多晶矽閘極模擬的結果和金屬閘極來做比較,最後,我們將討論的主題是用非白努力的電流表示方法,並比較非白努力方程式與傳統白努力方程式上的差異。zh_TW
dc.description.abstractIn this thesis, we use Poisson’s equation and continuity equations to design an equivalent circuit model for 2-D device simulation. The device simulation will be transformed into the circuit simulation. The simulation will become a mixed-level device and circuit simulation. We discuss the advantages and disadvantages between poly-Si gate and metal gate. And the simulation results of poly-Si gate will be compared with those of metal gate. Finally, the subject to be discussed is the non-Bernoulli equation for current expression. We will compare the Bernoulli method with non-Bernoulli method.en_US
DC.subject矩形網格zh_TW
DC.subject元件模擬zh_TW
DC.subject金氧半場效電晶體zh_TW
DC.subjectrectangular meshen_US
DC.subjectdevice simulationen_US
DC.subjectMOSFETen_US
DC.title多晶矽和金屬閘極於二維金氧半場效電晶體模擬比較zh_TW
dc.language.isozh-TWzh-TW
DC.titleComparison Between Polysilicon and Metal Gate in 2D MOSFET Simulationen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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