| DC 欄位 |
值 |
語言 |
| DC.contributor | 光電科學與工程學系 | zh_TW |
| DC.creator | 林子庭 | zh_TW |
| DC.creator | Tzu-Ting Lin | en_US |
| dc.date.accessioned | 2019-8-5T07:39:07Z | |
| dc.date.available | 2019-8-5T07:39:07Z | |
| dc.date.issued | 2019 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=105226012 | |
| dc.contributor.department | 光電科學與工程學系 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 高能脈衝磁控濺鍍(HiPIMS)技術為目前新一代的鍍膜技術，此技術的特色是藉由調變脈衝控制器的中斷時間(off time)來使靶材在極短脈衝時間內產生高達kW/cm^2的能量，使電漿密度提升進而使靶材的游離率提高，讓鍍製出的膜變的更緻密，有效提高膜的品質。本實驗使用高功率脈衝磁控濺鍍系統(HiPIMS)來鍍製高硬度抗反射多層膜，實驗第一階段藉由改變脈衝參數使其光學及機械性質有明顯變化來做分析，實驗第二階段則是根據前面實驗參數藉由光學軟體模擬設計出高硬度的多層抗反射膜並鍍製出來，最後將實驗成品做分析，得平均穿透率為93.7%的多層抗反射硬膜且硬度達到18GPa。 | zh_TW |
| dc.description.abstract | High power impulse magnetron sputtering, a new generation coating technology, is characterized for the high peak power up to kW/cm^2 by modulating on/off time of the pulse power controller. The plasma density near the sputtering target can be greatly increased to ionize the forming gases and Ar to improve the properties of the films effectively. In this study, anti-reflective hard coatings were deposited by high power impulse magnetron sputtering. First part of the study, nitride, oxynitride and silicon dioxide were prepared with different on/off time and analysed their optical and mechanical properties. Finally, the best parameters in the first part were applied to design and deposit multi-layer hard AR coating. The average transmittance of the AR coating was 93.7% and it’s hardness was 18 GPa. | en_US |
| DC.subject | 高能脈衝磁控濺鍍 | zh_TW |
| DC.subject | 抗反射多層膜 | zh_TW |
| DC.title | 高能脈衝磁控濺鍍系統鍍製高硬度抗反射多層膜之研究 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | Formation of the High-hardness Anti-reflective Coatings by High-power Impulse Magnetron Sputtering | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |