| dc.description.abstract | In this research, silicon germanium thin films for the application of the near infrared graphene electrode photodetector were fabricated, measured, and
analyzed. Germanium is a material for the near infrared wavelength applications, such as optical communication. However, the high cost of germanium wafer make it difficult to be commercialized. To reduce the cost, a silicon germanium thin film has been grown on the silicon substrate as a virtual germanium substrate. Silicon is diffused into the germanium thin film by using thermal annealing method, to form the silicon germanium thin film, whose optical energy gap can be increased, and the absorption wavelength is extended.
Another way to improve the property of silicon germanium photodetector is replacing the metallic electrodes as graphene ones. Normally, the metallic electrodes were utilized for the photodetectors. However, a part of light was blocked for the opaque property. In this study, graphene has been used as the electrodes of the photodetector. Because of its excellent characteristic of optical transmittance. The transmittance of a monolayer graphene in the infrared light region is up to 98.2% which can increase the absorption area and the photocurrent. Finally, the responsivity of the silicon germanium photodetector was achieved 0.25 mA/W for the wavelength 1310 nm. | en_US |