| DC 欄位 |
值 |
語言 |
| DC.contributor | 機械工程學系 | zh_TW |
| DC.creator | 劉柏億 | zh_TW |
| DC.creator | Po-Yi Liu | en_US |
| dc.date.accessioned | 2021-8-18T07:39:07Z | |
| dc.date.available | 2021-8-18T07:39:07Z | |
| dc.date.issued | 2021 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=108323033 | |
| dc.contributor.department | 機械工程學系 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 本研究是採用直徑55 μm之碳化鎢圓柱作為工具電極對石英晶圓材料進行脈衝複合偏壓電化學放電鑽孔之研究，進行一系列加工特性之研究，期望獲得較佳之加工能力與較小擴孔量。本研究採用電化學放電鑽孔時，藉由脈衝複合偏壓之方式進行單因子實驗分析，探討各種加工參數如工作電壓、進給速度、脈衝週期、衝擊係數以及主軸轉速等對於石英晶圓之各種加工特性影響，加工特性包含入、出口孔徑及出口破片情況。
採用脈衝複合偏壓電化學放電鑽孔加工時，脈衝複合偏壓會使得工具電極上的氣泡不會因為脈衝休止時間而完全消散，這是因為在休止時間時，工作電壓還是可以維持在臨界電壓附近，才不會使氣泡完全消散，並在下一次脈衝開啟時能夠快速生成氣膜，以達到精度要求，實驗結果顯示利用脈衝複合偏壓加工，能有效提升加工能力與材料移除率以及改善出口破裂之情況，並能獲得較佳的擴孔量，在工作電壓42 V、進給速度25 µm/min、脈衝週期30 µs、衝擊係數20 %及主軸轉速100 rpm之下，有最佳孔徑，且能將入、出口孔徑控制在80 ± 8µm之精度內。 | zh_TW |
| dc.description.abstract | This study used a 55 μm diameter tungsten carbide cylindrical rod as a tool electrode to perform pulse compound bias voltage electrochemical discharge drilling on quartz wafer materials. A series of research on processing characteristics were conducted, hoping to obtain better processing ability and smaller hole expansion. This study performed a single-factor experimental of electrochemical discharge drilling by using pulse compound bias voltage. The effect of the working voltage, feed speed, pulse period, impact coefficient and spindle speed on the diameters of the hole inlet, the diameters of the hole outlet and hole outlet fragments were discussed in the experiment.
When using pulsed compound bias voltage electrochemical discharge drilling, it will prevent the bubbles on the tool electrode from being completely dissipated during the pulse resting period. The reason is that the working voltage can still be maintained near the critical voltage during the rest time, the bubbles will not completely dissipate, and the gas film can be quickly formed when the next pulse is turned on. The phenomenon achieve the accuracy requirements. The experimental results show that the processing capability, material removal rate, outlet fragment can be effectively improved by using pulsed compound bias voltage. It can also obtain a smaller hole expansion. At working voltage 42 V, feed speed 25 µm/min, pulse period 30 µs, impact coefficient 20 % and spindle speed 100 rpm, the best diameters of the hole can be obtained. Both the diameters of the hole inlet and outlet can be controlled within the accuracy of 80 ± 8 µm. | en_US |
| DC.subject | 電化學放電鑽孔 | zh_TW |
| DC.subject | 脈衝複合偏壓 | zh_TW |
| DC.subject | 石英晶圓 | zh_TW |
| DC.subject | Electrochemical discharge drilling | en_US |
| DC.subject | Pulse compound bias voltage | en_US |
| DC.subject | Quartz wafer | en_US |
| DC.title | 脈衝複合偏壓電化學放電加工石英晶圓之研究 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | Research on Pulsed compound Bias Voltage Electrochemical Discharge Machining Quartz Wafer | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |