| DC 欄位 |
值 |
語言 |
| DC.contributor | 光電科學與工程學系 | zh_TW |
| DC.creator | 陳政瑜 | zh_TW |
| DC.creator | Jheng-Yu Chen | en_US |
| dc.date.accessioned | 2023-8-15T07:39:07Z | |
| dc.date.available | 2023-8-15T07:39:07Z | |
| dc.date.issued | 2023 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=110232001 | |
| dc.contributor.department | 光電科學與工程學系 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 本論文利用UVLED光源結合複眼透鏡和聚光透鏡的設計，實現環保且高均勻度的曝光機光型。隨著科技的持續發展，在PCB製造中，考慮到曝光尺寸的不同，我們提出了一種不需要大量工程改造的光型疊加方法，通過光型的疊加來增加曝光面積的尺寸，以達到所需的尺寸大小。這樣的方法可以有效且快速地滿足生產需求並降低設備成本。
總結以上，本論文提出一種以光型疊加方式增加曝光面積尺寸的方法，並討論再疊加後曝光光型的有效面積和均勻度的影響。同時，介紹利用UVLED光源結合複眼透鏡和聚光透鏡打造高均勻度的曝光機光型的設計。 | zh_TW |
| dc.description.abstract | This paper proposes an environmentally friendly and highly uniform exposure machine light pattern by utilizing UVLED light sources combined with compound eye lenses and condenser lenses. With the continuous advancement of technology in PCB manufacturing, considering the varying exposure sizes, we present an overlay method for light patterns that does not require extensive engineering modifications. By overlaying light patterns, the exposure area size can be increased to meet the desired dimensions without the need for significant alterations. This approach effectively and rapidly fulfills production requirements while reducing equipment costs.
In summary, this paper introduces a method to increase the exposure area size through light pattern overlay and discusses the impact on the effective area and uniformity of the exposure light pattern after overlaying. Additionally, it presents the design of a highly uniform exposure machine light pattern achieved by combining UVLED light sources with compound eye lenses and condenser lenses. | en_US |
| DC.subject | 曝光機 | zh_TW |
| DC.subject | 曝光面積 | zh_TW |
| DC.subject | 光型疊加 | zh_TW |
| DC.subject | 有效面積 | zh_TW |
| DC.subject | 均勻度 | zh_TW |
| DC.subject | exposure machine | en_US |
| DC.subject | exposure area | en_US |
| DC.subject | light pattern overlap | en_US |
| DC.subject | effective area | en_US |
| DC.subject | uniformity | en_US |
| DC.title | 曝光機照明光型擴展之研究 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | Study of Expansion of Illumination Light Pattern of Mask Aligner | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |