| dc.description.abstract | The paper is discussed about designing the nearly normal incident multilayer mirrors in the X-Ray region and analyzing the multilayer based on measuring X-Ray reflectivity .
For the nearly normal incident multilayer mirrors at 13.6 nm , our program can optimize the structure of the high–reflectivity mirrors . After optimizing the 53 layers Mo/Si mirrors , we can find out that the thickness of the Mo and Si thin film are 3.03nm and 4.07nm . For s-pol. , the reflectivity of the quarter wave stick is 69.42% , and the reflectivity of our design is 72.12% . For p-pol. , the reflectivity of the quarter wave stick is 65.97% , and the reflectivity of our design is 69.36% .
It is important for the thickness mistakes and roughness of nearly normal incident multialyer mirrors . We manufacture the amorphous thin film by using ion beam sputtering deposition , and obtain the characteristics of the multilayers by measuring the X-Ray reflectivity of radiation of Cu target , for example the mass density , extinction coefficient , thickness of the thin film and the roughness of the interface . Generally speaking , the roughnesses by fitting X-Ray reflectivity are different from the roughnesses of using AFM . This result is that the area by X-Ray illuminated is larger than by AFM measuring , and X-Ray reflectivity contains the data of high frequency waves. | en_US |