博碩士論文 89226015 完整後設資料紀錄

DC 欄位	值	語言
DC.contributor	光電科學與工程學系	zh_TW
DC.creator	潘鼎翔	zh_TW
DC.creator	Ding-Shang Pan	en_US
dc.date.accessioned	2003-7-7T07:39:07Z
dc.date.available	2003-7-7T07:39:07Z
dc.date.issued	2003
dc.identifier.uri	http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=89226015
dc.contributor.department	光電科學與工程學系	zh_TW
DC.description	國立中央大學	zh_TW
DC.description	National Central University	en_US
dc.description.abstract	本論文探討利用Twyman Green干涉儀，配合相位偏移技術，擷取干涉圖形，在經由Hariharan相位還原法，分析干涉圖形，可得到其相位圖，並可知其基板的表面輪廓，而經由測定基板在鍍膜前後的面形變化量，求的其應力值。另利用Zernike 多項式擬合法，來扣除人為的誤差，如傾斜，離焦等…其方法比其他的量測技術上，更為精確。接著則利用電子鎗蒸鍍薄膜材料在配合離子輔助鍍膜系統，製鍍光學薄膜，利用不同的回火溫度來作處理，來尋求其高折射率、低吸收、低表面粗糙度、低應力的光學薄膜。	zh_TW
dc.description.abstract	The thesis make use of Twyman Green interferometry and phase shift interferometry to grab interferogram. By Hariharan PSI algorithm we can analyze interferogram in order to get the phase map and know the substr- ate contour map. The stress in thin film can be derived by comparing the deflection of the substrate before and after film deposition . We also use Zernike polynomial fitting algorithm to remove errors,such as tilt and dfocus.Compared with other techniques,the present method is more accurate.we use e-beam evaporation(PVD) with ion-assisted deposition(IAD) to evaporate optical thin film,by using diffenent baking temperature to find high refractive index、low extinction coefficient、low roughness、and low stress in the optical thin film.	en_US
DC.subject	應力量測	zh_TW
DC.subject	干涉儀	zh_TW
DC.subject	Zernike 多項式	zh_TW
DC.subject	相位還原演算法	zh_TW
DC.subject	Zernike polynominal fitting	en_US
DC.subject	stress	en_US
DC.subject	PSI	en_US
DC.title	光學薄膜應力量測與分析之探討	zh_TW
dc.language.iso	zh-TW	zh-TW
DC.title	The measurement and analysis of Stress for Optic Thin Film	en_US
DC.type	博碩士論文	zh_TW
DC.type	thesis	en_US
DC.publisher	National Central University	en_US