| DC 欄位 |
值 |
語言 |
| DC.contributor | 光電科學與工程學系 | zh_TW |
| DC.creator | 童啟弘 | zh_TW |
| DC.creator | Chi-Hong Tung | en_US |
| dc.date.accessioned | 2002-6-27T07:39:07Z | |
| dc.date.available | 2002-6-27T07:39:07Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=89226033 | |
| dc.contributor.department | 光電科學與工程學系 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 本論文將介紹在電阻加熱及電子槍蒸鍍系統中加入離子助鍍法(IAD)製鍍深紫外光區(193nm)之氟化鑭(LaF3)之光學薄膜，主要研究離子輔助法對於薄膜折射率、消光係數、穿透率等光學性質之影響，以及薄膜之水氣吸附、微觀結構、表面粗糙度與結晶性之分析，並探討會令薄膜造成能量損耗的原因，以製鍍出一高品質之光學薄膜，期望能搭配各種低折射率材料做疊加設計，便於提供紫外光區光電科學之應用。 | zh_TW |
| dc.description.abstract | The study of lanthanum fluoride optical thin film deposited by boat and e-beam evaporation (PVD) with ion-assisted deposition (IAD) for UV application was concerned in this thesis. Due to IAD, we can improve optical and micro-structural properties including refractive index、 extinction coefficient、surface roughness and packing density for the production of advanced coatings which are required in laser material processing and semiconductor lithography. | en_US |
| DC.subject | 氟化鑭 | zh_TW |
| DC.subject | 紫外光 | zh_TW |
| DC.subject | 離子助鍍 | zh_TW |
| DC.subject | ion-beam assisted deposition | en_US |
| DC.subject | ultraviolet | en_US |
| DC.subject | LaF3 | en_US |
| DC.title | 離子輔助熱蒸鍍紫外光學薄膜之研究 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | Optical Thin Film Deposited with Ion Assisted for UV Application | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |