博碩士論文 90323020 完整後設資料紀錄

DC 欄位 語言
DC.contributor機械工程學系zh_TW
DC.creator簡炳林zh_TW
DC.creatorBiing-Lin Jangen_US
dc.date.accessioned2003-7-9T07:39:07Z
dc.date.available2003-7-9T07:39:07Z
dc.date.issued2003
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=90323020
dc.contributor.department機械工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract摘要 微機電系統目前是世界上每一個家積極投入的一個新領域,其主要係利用微技術、系統技術及材料與效應技術,製造出微感測器、訊號處理機及微引動器等。本文的研究主要是在探討以熱氧化法製成二氧化鈦的材料特性與分析,另外亦探討以微機電的製程技術,研究半導體感測器對蛋白質的感測性能。本實驗考慮的參數有: 溫度,流量,壓力。其中又以溫度,流量對製程的影響較大,壓力的影響則較小。製成二氧化鈦薄膜之後,再對二氧化鈦薄膜作電阻率量測,接觸角量測,X光繞射光譜(XRD)分析,紅外線光譜(FTIR)之分析。經過電阻率之量測,若鈦直接長在矽基板上,則電阻率隨O2流量的增加而增加,另外鈦直接長在矽基板上,則電阻率隨溫度的增加而增加,但在600℃有例外。乃是有形成TiSi2。若鈦長在oxide上,與鈦直接長在矽基板上比較,則氧化後,前者之電阻率一定比後者高。另外有作接觸角量測,乃是蛋白質物質若要與二氧化鈦薄膜發生反應,則二氧化鈦薄膜必須是親水性,否則若是疏水性,則無法發生反應。 經過量測,PVD的方法較CVD的方法有較小之接觸角,顯示PVD法有較佳之親水性。而X光繞射光譜分析,在2Θ=25°之處,有anatase(101)之peak出現,在2Θ=48°之處,有anatase(200)之peak出現,在2Θ=54°之處,有anatase(105)之peak出現,最後作FTIR之分析,CVD方法較PVD方法有較強之peak。溫度越高,不管是PVD或CVD方法,皆有較強之peak。zh_TW
dc.description.abstractMicroelectromechanical systems is a new field in the world now,it use micro-technology,system technology,materials and effect technology, manufacture microsensors,signal processor,and microactuators.The research I make is to study "use thermal oxidation method to form titanium dioxide and its materials character and analysis" .The experiment parameters including:temperature, oxygen flow,pressure.The main parameters are temperature,oxygen flow ,and pressure affects small.When titanium dioxide thin film is formed, furthermore,to measure resistivity,measure contact angle,analyze XRD,analyze FTIR.After resistivity measurement,if titanium deposit on silicon substrate directly,then resistivity increases when oxygen flow increases.If titanium deposit on silicon substrate directly,then resistivity increases when temperature increases,but sometimes has exception when temperature is 600℃,because has formed titanium silicide.If titanium deposit on oxide,compare with titanium deposit on silicon substrate,after oxidation,the former has higher resistivity.According to contact angle measurement ,if protein can react with titanium dioxide,the protein must be hydrophilic,otherwise,if it is hydrohobic,it can`t react with titanium dioxide. After measurement,the PVD method has smaller contact angle than CVD method.It shows PVD method has better hydrophilic.According to XRD analysis, when 2Θ=25°,it has anatase(101)peak,when 2Θ=48°,it has anatase(200)peak,when 2Θ=54°,it has anatase(105)peak.Finally,after FTIR analysis, CVD method has stronger peak than PVD method,when temperature increase,no matter PVD method or CVD method,they have stronger peak.en_US
DC.subject二氧化鈦zh_TW
DC.subject接觸角zh_TW
DC.subject親水性zh_TW
DC.subject微機電zh_TW
DC.subjectcontact angleen_US
DC.subjecttitanium dioxideen_US
DC.title二氧化鈦薄膜之製備與分析zh_TW
dc.language.isozh-TWzh-TW
DC.titleManufacture and Analysis of Titanium Dioxide thin filmen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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