DC 欄位 |
值 |
語言 |
DC.contributor | 電機工程學系 | zh_TW |
DC.creator | 劉育全 | zh_TW |
DC.creator | Yu-Chuan Liu | en_US |
dc.date.accessioned | 2004-7-10T07:39:07Z | |
dc.date.available | 2004-7-10T07:39:07Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=91521054 | |
dc.contributor.department | 電機工程學系 | zh_TW |
DC.description | 國立中央大學 | zh_TW |
DC.description | National Central University | en_US |
dc.description.abstract | 摘要
本論文針對覆晶發光二極體之高反射歐姆接觸電極,對元件熱穩定性影響,做一系列探討,發現傳統作法之覆晶發光二極體,熱穩定性不佳的原因是因為,p-type歐姆接觸電極與高反射金屬層,遇高溫後會相互擴散,因高反射金屬材料如Al、Ag皆為低功函數材料,當元件遇高溫時,高反射金屬材料向下擴散至p-type GaN表面由於與p-type功函數相差太大,接面處型成一個位障,故元件工作電壓因此升高;推知原因後吾人便提出利用製程的手法,將歐姆接觸電極與金屬高反射層區隔開,來改善熱穩定性問題最後再以ITO/SiO2/Al/SiO2組合之高反射歐姆電極製作元件,得到比傳統高反射歐姆電極Ni/Au/Al/Ti/Au製作之元件,高出約15%的反射率,故其外部量子效率,也比傳統高反射歐姆電極製作之覆晶發光二極體元件提升約1.5倍。 | zh_TW |
dc.description.abstract | A light-emitting device comprises a multi-layer structure including one or more active layer configured to irradiate light in response to the application of an electric signal, a transparent passivation layer laid over an outmost surface of the multi-layer stack, a reflector layer laid over the passivation layer, and a plurality of electrode pads coupled with the multi-layer structure. In a manufacture process of the light-emitting device, the reflector layer and the passivation layer are patterned to form at least one opening exposing an area of the multi-layer structure. One electrode pad is formed through the opening of the reflector layer and the passivation layer to connect with the multi-layer structure. | en_US |
DC.subject | 二極體 | zh_TW |
DC.subject | 覆晶 | zh_TW |
DC.subject | 氮化鎵 | zh_TW |
DC.subject | Flip-chip | en_US |
DC.subject | LED | en_US |
DC.subject | GaN | en_US |
DC.title | 氮化銦鎵發光二極體之研製 | zh_TW |
dc.language.iso | zh-TW | zh-TW |
DC.title | Investigation of InGaN/GaN Light Emitting Diode | en_US |
DC.type | 博碩士論文 | zh_TW |
DC.type | thesis | en_US |
DC.publisher | National Central University | en_US |