| dc.description.abstract | This study was to modify surface of material by Plasma and screen-printing coating. One of the study issue was that Ti-containing amorphous hydrogenated carbon (Ti-C:H) thin films were deposited on SKH51 and WC substrates by filtered cathodic vacuum arcing (FCVA) and high power pulse magnetron sputtering (HIPIMS) in order to reduce friction coefficient and wear rate. The Ti-C:H thin films deposition used the mixture of Ar and C2H2 gases atmosphere with the titanium metal as cathodic materials. Furthermore, the effects of substrate bias, target current and substrate-to-target distance on film properties have been studied from FCVA and HIPIMS coating system. The film properties including composition, morphology, microstructure, mechanical and tribological characterizations were investigated by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), Nanoindenter and pin-on-disk tribometer, respectively. As a result, the surface of films was smooth, mean coefficient of friction was less than 0.1, wear rate was 10-17 m3/Nm, and critical load was more than 5 kg.
Moreover, the screen-printing method also was investigated in the study. The LSCF and LSM films were applied on a Crofer22 APU interconnect for solid oxide fuel cells (SOFC) by screen-printing method. It was then tested in a simulated oxidizing environment, 800 ◦C for 200 h. The results showed that the LSCF film can change the oxidation behavior of Crofer22 APU. Moreover, long-term electrical resistance measurement also indicated that area-specific resistance (ASR) of the alloy with LSCF coating film is significantly lower than that of the LSM coating.
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