| DC 欄位 |
值 |
語言 |
| DC.contributor | 光電科學與工程學系 | zh_TW |
| DC.creator | 卓文浩 | zh_TW |
| DC.creator | Wen-Hao Cho | en_US |
| dc.date.accessioned | 2006-7-14T07:39:07Z | |
| dc.date.available | 2006-7-14T07:39:07Z | |
| dc.date.issued | 2006 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=93226008 | |
| dc.contributor.department | 光電科學與工程學系 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 本論文對氟化鎂、氟化鑭、氟化釓三種材料做蒸鍍角度從20 度
到70 度斜向蒸鍍，量測其柱狀傾斜角、應力以及薄膜對P、S 偏振光
垂直入射於波長193nm 的折射率。柱狀傾斜角以掃瞄式電子顯微鏡
觀察之，應力以相位移式應力量測干涉儀測量，折射率則以橢偏儀量
測，並以Cauchy Law 做擬合。柱狀傾斜角方面發現Tangent rule：
tan??E ?tan?的係數E 只有在蒸鍍角度大於50 度才會趨於定值，
不同材料其係數E 不同。隨著蒸鍍角鍍的增大會有壓應力的趨勢。然
而雙折射的特性並不是單純的隨蒸鍍角度增加而遞增，氟化鎂在蒸鍍
角度為70 度時有最大的折射率差異(0.0576)。氟化鑭需在30 度至60
度之間才明顯的折射率差異，其值約在0.03～0.04 之間。而氟化釓在
蒸鍍角度從40 度到50 度之間Ns 與Np 的大小會相反過來。應力方
面會隨著蒸鍍角度有先上升在減小的現象。 | zh_TW |
| dc.description.abstract | Obliquely depositing Magnesium fluoride, Lanthanum fluoride, and
Gadolinium fluoride for deposition angles in the range 20°–70°. Column
angles were determined ex situ from scanning electron microscopy
photographs of deposition-plane fractures. Stress was measured from
Phase-Shifting Interferometer. The birefringence,Δn = Ns – Np, was
determined from ellipsometer and fitted by Cauchy despersion law. We
show that the experimental column angles correspond the value predicted
by the modified form of the tangent-rule equation ??tan?1(E ?tan?)
where E is a constant for deposition angle that is larger than 50°. When
the deposition angel becomes large, the stress trend toward compressive
stress. However, birefringence does not increase progressively with the
deposition increases.Birefringence, Δ n = Ns – Np, of Magnesium
fluoride is 0.0576 for deposition angle in 70°. Birefringence of
Lanthanum fluoride becomes clear for deposition angle in the rang
30°-60°. Δn = 0.037 for deposition angle in 60°. However theΔn of
Gadolinium fluoride would be cross during deposition angle in 40° and
50°.When the deposition angle was increased, the stress would increase
first and then decrease progressively. | en_US |
| DC.subject | 柱狀結構 | zh_TW |
| DC.subject | 斜向蒸鍍 | zh_TW |
| DC.subject | 深紫外光 | zh_TW |
| DC.subject | DUV | en_US |
| DC.subject | column structure | en_US |
| DC.subject | obliquely deposited | en_US |
| DC.title | 193nm深紫外光斜向薄膜之研究 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | The Research of Obliquely Deposited Films at 193nm | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |