博碩士論文 952206027 完整後設資料紀錄

DC 欄位 語言
DC.contributor光電科學與工程學系zh_TW
DC.creator張逸謙zh_TW
DC.creatorYi-chien Changen_US
dc.date.accessioned2009-3-30T07:39:07Z
dc.date.available2009-3-30T07:39:07Z
dc.date.issued2009
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=952206027
dc.contributor.department光電科學與工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract本研究以熱阻舟蒸鍍氟化鑭(LaF3)薄膜,輔以持續式或脈衝式離子助 鍍,主要探討此兩種離子源助鍍對於熱蒸鍍氟化鑭在紫外波段(190nm~350n m)特性的影響,例如穿透率、折射率、光學耗損較持續式離子助鍍低14%, 脈衝離子助鍍能夠降低表面rms大約1/3消光係數等光學特性。利用脈衝式離 子源助鍍能夠使波長190nm時薄膜折射率由1.68上升至1.70、且因氟化鑭薄膜 的非均勻性得以改善而使光學厚度為1/2波長的穿透率回到基板。 另外觀察薄膜的微觀結構與結晶特性等,分析對薄膜特性的影響。利用 量測薄膜的光學特性、微觀結構、結晶特性等等,分析氟化鑭薄膜在紫外光 區產生光學耗損的原因,以了解持續性或脈衝式的離子助鍍在改善氟化鑭薄 膜膜質,且降低光學耗損上的差異。 zh_TW
dc.description.abstractThermal boat evaporation was employed to prepare LaF3 single-layer coatings for UV applications. Optical properties and microstructure, including transmittance, index refraction, extinction coefficient, and surface properties, were measured by spectrophotometer, ellipsometric, SEM, and AFM. With pulse mode IAD, we can make lanthanum fluoride thin film to have higher packing density and decrease annoying absorption at wavelength rage190 to 350nm caused by constant IAD. With optimized parameters, refraction index of lanthanum fluoride thin film was raised from 1.68 to 1.7 at 190nm, extinchomogeneity of tion coefficient was reduced 14%, and surface roughness was reduced 1/3. Since thin film’s quality was improved to reduce the inhomogeneous phenomenon, the transmittances of halfwave optical thickness go back to the transmittance of substrate. en_US
DC.subject脈衝式zh_TW
DC.subject離子助鍍zh_TW
DC.subject氟化鑭zh_TW
DC.subjectIADen_US
DC.subjectpulseen_US
DC.subjection-assisteden_US
DC.subjectLaF3en_US
DC.title脈衝式離子源助鍍氟化鑭薄膜之研究zh_TW
dc.language.isozh-TWzh-TW
DC.titleThe research of pulse ion beam-assisted deposition of lanthanum fluorideen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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