博碩士論文 983306005 完整後設資料紀錄

DC 欄位 語言
DC.contributor環境工程研究所在職專班zh_TW
DC.creator張榮峯zh_TW
DC.creatorJung-Feng Changen_US
dc.date.accessioned2011-7-11T07:39:07Z
dc.date.available2011-7-11T07:39:07Z
dc.date.issued2011
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=983306005
dc.contributor.department環境工程研究所在職專班zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract在液晶面板與半導體製程中,會使用光阻稀釋劑來清洗製程上多餘光阻劑,其所產生之廢光阻稀釋劑,可經由蒸餾純化後循環再利用,但因各製程所導入之技術不同導致產出之廢光阻稀釋劑組成也不盡相同,為有效提升蒸餾再利用回收效率,本研究利用實場所產出之廢光阻稀釋劑,經由實驗型蒸餾塔模擬純化後所得之再生光阻稀釋劑,經由氣相層析儀質譜儀之定性與成分分析,偵測出廢光阻稀釋劑內所含不純物種,再經由數量化多變量分析,找出主要影響回收效率之成分。 經實驗所測得之不純物共13種,在回收PGME時,經由多變量分析後所得R2為0.744,主要影響回收率之物質為乙酸正丁酯、環戊酮以及二甲苯,前兩種物質之沸點均介於PGME與PGMEA沸點之間,即120℃~145℃之間,推測因沸點相近而影響PGME之回收率,但二甲苯之沸點顯然較PGME高出許多,其影響回收率之物化機制,尚待探討;另外而在回收PGMEA時,經多變量分析R2則為0.764,其主要影響物質為甲基戊基酮以及2-羥基異丁酸甲酯兩項,而該兩項之沸點較接近PGMEA,因此屬於沸點相近之原因較大。 zh_TW
dc.description.abstractWaste thinner (WT) is generated from TFT-LCD and IC manufacturing processes when unreacted photoresistor is removed from the products using photoresistor thinner (PT). The waste thinner has been retrieved by applying distillation. However, in distillation to recover the target constituents of PTs (i.e., Propylene Glycol Monomethyl Ether and Propylene Glycol Monomethyl Ether Acetate, referred to as PGME and PGMEA), the co-existing compounds in the WT may hinder the distillation and reduced the retrieval efficiency of the target compounds of PT. Therefore, it is desirable to identify the co-existing pounds and their hindering mechanism in order for possible improvement of the distillation process. However, the compositions of the waste thinner may varied with the compositions of the parent PE and the manufacturing processes of TFT-LCD and IC. Furthermore, many recipes of the commercial PTs, unfortunately, are not revealed and the main PT compounds may or may not be available on the market. All this makes the identification of the co-existing compounds in the WTs and their mechanism to hinder the distillation more difficult even qualitative data from GC-MS analysis are available. Therefore, this study tried to identified the hindering compounds in the WT and their possible hindering mechanism by applying the qualitative data from GC-MS and multivariate analysis (i.e., Qualitative Theory Type I). Eighteen batches of WTs were conducted by column distillation apparatus, and the compositions of the WTs were determined before and after distillation; and the retrieval efficiency of target PT compounds were determined for each batch. By applying the Qualitative Theory Type I technique, the results indicate that in retrieving PGME, three compounds, n-Butyl acetate, Cyclopentanone, and Xylene were found to contribute to the hindering of distillation, while in retrieving PGMEA, two compounds, methyl amyl ketone and 2-hydroxyl methyl isobutyrate, were found of the main hindering compounds. The boiling points of the former two compounds fall between that of PGME and PGMEA (i.e, 120 oC-145 oC ) , and the azeotropic phenomenon is supposed to be the hindering mechanism of the distillation. The third compound in PGME retrieval has a boiling point much higher than 145 oC, the hindering mechanism is not clear. In PGMEA retrieval, the latter two compounds identified also have a boiling point close to that of PGMEA, and hindering in distillation is also supposed to be caused by the azeotropic effect. All the compounds found in this study are confirmed to be the main constituents of the common commercial PTs. The results of this study may contribute to the waste PT recycling industry for how to improve their distillation process further to raise the retrieval efficiency. en_US
DC.subjectPGMEAzh_TW
DC.subject蒸餾zh_TW
DC.subjectPGMEzh_TW
DC.subject共沸zh_TW
DC.subject廢光阻稀釋劑zh_TW
DC.subject光阻稀釋劑zh_TW
DC.subjectdistillationen_US
DC.subjectPGMEen_US
DC.subjectPGMEAen_US
DC.subjectwaste thinneren_US
DC.subjectazeotropic effecten_US
DC.subjectPhotoresistor thinneren_US
DC.title影響廢光阻稀釋劑蒸餾回收率之因子探討zh_TW
dc.language.isozh-TWzh-TW
DC.titleAffect the recovery of waste photoresist thinner factor of distillationen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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