博碩士論文 985201126 完整後設資料紀錄

DC 欄位 語言
DC.contributor電機工程學系zh_TW
DC.creator梁雅涵zh_TW
DC.creatorYa-han Liangen_US
dc.date.accessioned2011-7-21T07:39:07Z
dc.date.available2011-7-21T07:39:07Z
dc.date.issued2011
dc.identifier.urihttp://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=985201126
dc.contributor.department電機工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract本論文免除複雜的微影蝕刻步驟,利用間隙壁控制穿隧介電層的厚度來形成柵狀結構,進而完成三顆鍺量子點串連的穿隧二極體。當量子點之間的距離足夠靠近時,將會發生強烈的偶合效應而產生新的電子能階。本論文將量子點之間的穿隧介電層厚度控制在10 nm至18 nm之間。預期不僅可以看見明顯的偶合效應,且有助於提升穿隧電流的訊號/雜訊比。本論文成功地利用上述方法製作出三顆鍺量子點串連的穿隧二極體,且藉由變溫的電流─電壓曲線以及微分轉導─電壓曲線進行電性分析,進一步探討量子點內之量子效應。 zh_TW
dc.description.abstractIn this thesis, we are able to form triple coupled Ge-QD tunneling diodes with controlled thickness (10 nm-18 nm) of tunneling barrier by way of forming spacer layers on patterned grating structure without complicated, advanced lithography and etching. Closely coupled QDs will rend strong quantum mechanics effects and conspicuous charge interaction wherein. We experimental characterized the current-voltage (I-V) and differential conductance-voltage (G-V) of the so-formed triple-QD RTD and investigated the charge coupling effect wherein. en_US
DC.subject偶合量子點zh_TW
DC.subject穿隧二極體zh_TW
DC.subjectcoupled Ge-QDen_US
DC.subjecttunneling diodeen_US
DC.title偶合鍺量子點穿隧二極體之研製與電性分析zh_TW
dc.language.isozh-TWzh-TW
DC.titleFabrication and Electrical Characterization of Tripled Coupled Ge-QD Tunneling Diodeen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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