DC 欄位 |
值 |
語言 |
DC.contributor | 光電科學與工程學系 | zh_TW |
DC.creator | 邱奕昌 | zh_TW |
DC.creator | Yi-chang Chiou | en_US |
dc.date.accessioned | 2013-2-25T07:39:07Z | |
dc.date.available | 2013-2-25T07:39:07Z | |
dc.date.issued | 2013 | |
dc.identifier.uri | http://ir.lib.ncu.edu.tw:444/thesis/view_etd.asp?URN=992906001 | |
dc.contributor.department | 光電科學與工程學系 | zh_TW |
DC.description | 國立中央大學 | zh_TW |
DC.description | National Central University | en_US |
dc.description.abstract | 本論文利用質量流率計算出均溫板蒸氣室任意空間分佈之等效熱傳係數,利用紅外線穩態熱阻量測實驗與限元素分析法找出多孔性結構的等效熱傳係數,由實驗與模擬之驗證與分析,我們成功建立均溫板等效熱傳模型,且找出均溫板熱阻與質量流率的相關性,並可做為評估均溫板優劣參數。接著針對不同操作條件下的均溫板進行分析與比較,並找出最佳的操作條件。 | zh_TW |
dc.description.abstract | We success fully built an effective model that neatly describes heat-conducting behavior of vapor chamber, by obtaining the equivalent heat transfer coefficient of vapor space and the equivalent heat transfer of wick. and then we discovered the relationship between thermal resistance and mass flow rate of vapor chamber. Once the relation has found, we can treat mass flow rate as a factor of heat-conducting ability for every vapor chamber. Futhermore, we analyzed and compared different scenarios, and found the best operating condition of vapor chamber. | en_US |
DC.subject | 均溫板 | zh_TW |
DC.subject | 發光二極體 | zh_TW |
DC.subject | 熱阻 | zh_TW |
DC.subject | Vapor chamber | en_US |
DC.subject | Light emitting diodes | en_US |
DC.subject | Thermal resistance | en_US |
DC.title | 均溫板等效模型建立與熱特性量測 | zh_TW |
dc.language.iso | zh-TW | zh-TW |
DC.title | A simple model for evaluating the thermal properties of vapor chamber | en_US |
DC.type | 博碩士論文 | zh_TW |
DC.type | thesis | en_US |
DC.publisher | National Central University | en_US |