混摻不同比例之聚(苯乙烯-b-2乙烯吡啶)共聚物於溶劑退火下之形態轉變探討

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姓名

程楚仁(Chu-Ren Chen) 查詢紙本館藏

畢業系所

化學工程與材料工程學系

論文名稱

混摻不同比例之聚(苯乙烯-b-2乙烯吡啶)共聚物於溶劑退火下之形態轉變探討
(Self-Assembly in Thin Films of Binary Blends of polystyrene-block-poly(2-vinylpyridine) PS-b-P2VP with Solvent Vapor Annealing)

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摘要(中)

在此研究中，我們利用小角度散射儀(GISAXS)、原子力顯微鏡(AFM)、以及光學顯微鏡(OM)鑑定混摻不同分子量之PS-b-P2VP聚(苯乙烯-b-2乙烯吡啶)嵌段共聚物利用氯仿與三氯乙烯溶劑退火之微相結構。在我們使用的三種分子量PS-b-P2VP之中，其中兩種各自會形成層板結構而另一種則會形成圓柱結構。在混摻兩不同分子量PS-b-P2VP互溶的情況下，隨著混摻比例的不同，我們可以發現一系列微相結構的變化，從垂直層板、垂直圓柱、兩相共存到平行圓柱狀。微相結構會隨著混合系統的組成而發生改變。值得注意的是，在不同區間，奈米結構間距及晶格間距與混摻比例會有不同的變化趨勢。而co-surfactant effect與chain-dislodgment這兩個機制，則是主導微相結構與結構尺寸在混合系統中變化的主要原因。

摘要(英)

In this work, thin film morphologies of a series of binary blends of two PS-b-P2VP block copolymers (BCPs) under solvent annealing in chloroform and TCE vapor were investigated by grazing-incident small-angle X-ray scattering, atomic force microscopy and optical microscopy. One PS-b-P2VP symmetric BCP forms lamellae and the asymmetric other one form cylinders. As formed as thin films in a miscible state, a series of morphologies, such as perpendicular lamellae, perpendicular cylinders, coexistence of two phases and parallel cylinders, were obtained. The morphologies were found to depend on the compositions of the mixtures. In particular, different trends of lattice distance with composition were found at different constituent regions. Two mechanisms, co-surfactant effect and chain dislodgment, account for the variations in morphology and lattice distance as well as domain size.

關鍵字(中)

★ 溶劑退火
★ 嵌段共聚物
★ 高分子物理

關鍵字(英)

★ Solvent annealing
★ Block copolymer
★ Polymer Physics

論文目次

摘要 II
英文摘要 III
致謝 IV
目錄 V
圖目錄 VIII
表目錄 XIV
第壹章文獻回顧 - 1 -
一、嵌段共聚物 (Block copolymer) - 1 -
1-1 嵌段共聚物之自組裝機制 (self-assemble) - 2 -
1-2 塊材系統微相分離 - 3 -
1-3 薄膜系統微相分離 - 4 -
1-4 膜厚相稱性與薄膜表面能之關係 - 5 -
二、外界效應誘導薄膜有序化 (Inducing High Order Nanostructure of Block Copolymer) - 8 -
2-1 熱退火 (Thermal Annealing) - 8 -
2-2 溶劑退火 (Solvent Vapor Annealing) - 9 -
三、混摻系統 (Blending system) - 16 -
第貳章實驗 - 23 -
一、實驗材料 - 23 -
二、實驗儀器 - 24 -
三、實驗製備與設計 - 24 -
3-1 基材處理 - 26 -
3-2 配置高分子溶液 - 26 -
3-3 旋轉塗佈法 (Spin coating) - 27 -
3-4 溶劑退火 (Solvent vapor annealing, SVA) - 27 -
3-5 試片量測與鑑定 (Sample characterization) - 28 -
第參章儀器原理 - 30 -
一、光學顯微鏡 (Optical microscope) - 30 -
二、反射式膜厚儀 (Optical Interferometer) - 30 -
三、原子力顯微鏡 (Atomic force microscope) - 31 -
四、低略角X光散射儀 (Grazing-Incident small-angle X-ray scattering, GISAXS) - 35 -
第肆章結果與討論 - 37 -
一、薄膜厚度在溶劑退火過程中之變化 - 37 -
1-1 薄膜厚度變化 - 37 -
1-2 薄膜厚度與χ值之影響 - 41 -
二、膜厚效應 (The effect of film thickness) - 46 -
三、溶劑移除速率 - 51 -
四、微相結構方向性 - 53 -
五、混摻系統之探討 - 57 -
5-1 高分子量比例之混摻系統 (Binary blending system with high molecular weight ratio) - 58 -
5-2 低分子量比例之混摻系統 (Binary blending system with low molecular weight ratio) - 65 -
5-3 探討混摻系統之機制與Lattice-spacing變化 - 70 -
5-4 探討分子量比例與圓柱有序程度之關係 - 77 -
5-5 探討不同溶劑對混摻系統之影響 - 80 -
第伍章結論 - 84 -
第陸章參考文獻 - 86 -

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指導教授

孫亞賢(Ya-Sen Sun)

審核日期

2020-7-29

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